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Wagner; Matthias
Jena, DE
No. of patents:

Patent Number Title Of Patent Date Issued
6927853 Method and arrangement for optical stress analysis of solids August 9, 2005
A method for optical stress analysis comprises the steps of directing an incident beam of polarized light to the sample to be analyzed and analyzing a light bundle exiting the sample in two detection channels extending perpendicular to one another with respect to the polarization dir
6081127 Method and arrangement for the response analysis of semiconductor materials with optical excitat June 27, 2000
The invention is directed to a method and an arrangement for the response analysis of semiconductor materials with optical excitation. The object of the invention, to find a new type of response analysis of semiconductor materials with optical excitation which also allows a sufficiently
5408327 Process and arrangement for photothermal spectroscopy April 18, 1995
A process and arrangements for photothermal spectroscopy (thermal wave analysis) by the single-beam method with double modulation technique. A single-beam method is developed making use of the advantages of double modulation technique in detecting the photothermally generated difference

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