| Patent Number |
Title Of Patent |
Date Issued |
| 4878086 |
Flat panel display device and manufacturing of the same |
October 31, 1989 |
| A flat panel display device, such as a liquid crystal panel display device, of large size and a method and apparatus of manufacture of the same. The display device may be provided by discrete or divided display sections. For the manufacture of the panel display device, a pattern for form |
| 4834540 |
Projection exposure apparatus |
May 30, 1989 |
| A projection exposure apparatus for projecting a pattern, formed on a reticle, upon a wafer by way of a projection lens system is disclosed. The apparatus includes an alignment system wherein light is projected upon an alignment mark of the wafer by use of the projection lens system, and |
| 4814830 |
Flat panel display device and manufacturing of the same |
March 21, 1989 |
| A flat panel display device, such as a liquid crystal panel display device, of large size and a method and apparatus of manufacture of the same. The display device may be provided by discrete or divided display sections. For the manufacture of the panel display device, a pattern for form |
| 4814829 |
Projection exposure apparatus |
March 21, 1989 |
| A projection exposure apparatus for projecting a pattern of a reticle upon a wafer by use of a projection lens system, is disclosed. The apparatus is arranged so that a mark illuminating light is projected upon the wafer from between the projection lens system and the wafer and not by wa |
| 4659228 |
Aligning apparatus |
April 21, 1987 |
| Disclosed is an aligning apparatus in which two bodies such as a semiconductor mask and a wafer having elongate (or bar-like) alignment marks are scanned by a bar-like beam having an elongate irradiating area and further scanned by the bar-like beam with the direction of inclination |
| 4651009 |
Contact exposure apparatus |
March 17, 1987 |
| An apparatus wherein a first thin member and a second thin member, the first thin member bearing a pattern, and the second thin member is exposed to the pattern of the first thin member. It includes a vacuum line for discharging a gas existing between the first thin member and the second |
| 4611122 |
Signal detection apparatus with plural elongate beams corresponding |
September 9, 1986 |
| A signal detection apparatus comprises a device for forming with separable lights illumination areas extending in different plural directions, a scanner for causing the illumination areas to scan bar-like marks extending in different directions on an object, and a photoreceptor for s |
| 4576475 |
Contacting method and apparatus in contact copying |
March 18, 1986 |
| A contacting method comprises the steps of holding a photomask and a wafer at a predetermined interval, curving at least one of the photomask and the wafer so as to form a convexity relative to the other, and moving the photomask and the wafer relative to each other to bring them into in |
| 4315201 |
Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements |
February 9, 1982 |
| An alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and wafer are used in manufacturing semiconductor circuit elements. In the apparatus, the mask and wafer are scanned to obtain |
