| Patent Number |
Title Of Patent |
Date Issued |
| 7553518 |
Substrate processing method |
June 30, 2009 |
| A substrate processing apparatus includes a reaction chamber for simultaneously processing a plurality of process substrates, a boat for loading the process substrates into the reaction chamber, and a stocker for storing a multiple number of dummy substrates, at least a portion of th |
| 7003219 |
Substrate processing method |
February 21, 2006 |
| A substrate processing apparatus includes a reaction chamber for simultaneously processing a plurality of process substrates, a boat for loading the process substrates into the reaction chamber, and a stocker for storing a multiple number of dummy substrates, at least a portion of th |
| 6923867 |
Substrate processing apparatus and method for manufacturing semiconductor device |
August 2, 2005 |
| A substrate processing apparatus and a method for manufacturing a semiconductor device can supply the vapor of the raw material to the substrate without fail. A main heater 22 is prepared outside the outer tube 21, an inner tube 23 is prepared inside the outer tube 21, a cap 24 that |
| 6780251 |
Substrate processing apparatus and method for fabricating semiconductor device |
August 24, 2004 |
| A substrate processing apparatus includes a first holder made of silicon carbide or silicon and a second holder made of quartz. Each of the first and the second holder is of a ring shape and the second ring shaped holder is mounted on the first holder. The second holder is used to mount |
| 6712909 |
Substrate processing apparatus and method for manufacturing semiconductor device |
March 30, 2004 |
| A substrate processing apparatus and a method for manufacturing a semiconductor device can resolve the problems that semiconductor film by-products are incorporated into a boat rotation mechanism so as to allow the mechanism portion to be locked, whereby a high quality semiconductor |
| 6540465 |
Substrate processing apparatus |
April 1, 2003 |
| A substrate processing apparatus that includes a preliminary chamber and a substrate transferring apparatus. The substrate transferring apparatus is disposed in the preliminary chamber for transferring substrate or substrates in and out of a cassette which accommodates the substrate or |
| 6527884 |
Hydrogen annealing process and apparatus therefor |
March 4, 2003 |
| An apparatus for selectively implementing a depressurized or an atmospheric hydrogen annealing process comprises a reaction chamber, a hydrogen gas introduction line for feeding hydrogen gas into the reaction chamber and an atmospheric exhaust line and a depressurized exhaust line, which |
| 6495473 |
Substrate processing apparatus and method of manufacturing semiconductor device |
December 17, 2002 |
| A substrate processing apparatus, wherein a flowing direction of a gas flow which has flown upwardly and ascended in an inner tube (3A) is changed at an upper portion of the inner tube (3A) so as to be flown between the inner tube (3A) and an outer tube (2A) and exhausted outwardly, |
| 6482753 |
Substrate processing apparatus and method for manufacturing semiconductor device |
November 19, 2002 |
| An apparatus and a method for manufacturing a semiconductor device can prevent formation of reaction by-products at a cooled metal flange, and can allow a maintenance period of an apparatus to become longer. A vertical CVD apparatus as a substrate processing apparatus for processing |
| 6332898 |
Substrate processing apparatus and maintenance method therefor |
December 25, 2001 |
| A substrate processing apparatus comprises a semiconductor wafer processing chamber, a wafer transfer device, a wafer cassette holding unit, a wafer cassette transfer device and a wafer cassette bringing in/out section disposed in this order and a housing. The wafer cassette holding unit |
| 6318944 |
Semiconductor fabricating apparatus, method for modifying positional displacement of a wafer in |
November 20, 2001 |
| A semiconductor fabricating apparatus having a vertical reaction furnace, a boat for holding plural wafers in a multi-layered fashion and being loaded into the vertical reaction furnace, a storage disposed at a location corresponding to the boat for storing at least one of the wafer cass |
| 6251189 |
Substrate processing apparatus and substrate processing method |
June 26, 2001 |
| The present invention is constituted so as to improve a quartz gas supply portion utilized in a normal pressure furnace, and to keep to a minimum the damage incurred by a normal pressure furnace by the shock from an earthquake. Quartz gas supply piping 25 for supplying a reactant gas is |
| 6143040 |
Substrate processing apparatus and maintenance method therefor |
November 7, 2000 |
| A substrate processing apparatus comprises a semiconductor wafer processing chamber, a wafer transfer device, a wafer cassette holding unit, a wafer cassette transfer device and a wafer cassette bringing in/out section disposed in this order and a housing. The wafer cassette holding unit |
| 5669644 |
Wafer transfer plate |
September 23, 1997 |
| A wafer transfer plate adapted to be disposed on a wafer transfer unit for transferring a wafer within a wafer manufacturing system, which comprises at least one wafer contact portion designed to be held in contact with the wafer as the wafer transfer plate is loaded with the wafer, a co |
