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Tate; Naoto
Annaka Gunma, JP
No. of patents:

Patent Number Title Of Patent Date Issued
7288418 Process for treating substrates for the microelectronics industry, and substrates obtained by th October 30, 2007
A process for treating substrates for the microelectronics or optoelectronics industry, wherein the substrates include on at least one of their faces a working layer in which components are intended to be formed. The process includes a step of annealing under a reductive atmosphere f
7029993 Method for treating substrates for microelectronics and substrates obtained according to said me April 18, 2006
The invention relates to a method for treating substrates (50) for microelectronics or optoelectronics, whereby said substrates comprise a useful layer (52) on at least one of the surfaces thereof. The inventive method includes a mechanical/chemical polishing step occurring on a bare

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