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Inventor:
Tanaka; Satoru
Address:
Tosu, JP
No. of patents:
1
Patents:












Patent Number Title Of Patent Date Issued
7803230 Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used f September 28, 2010
In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the su










 
 
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