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Inventor: Tamamushi; Shuichi
Address: Kanagawa, JP
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7554107 |
Writing method and writing apparatus of charged particle beam, positional deviation measuring me |
June 30, 2009 |
| A charged particle beam writing method includes measuring a topography of a backside of a substrate without an influence of a gravity sag, calculating a first positional deviation amount of a pattern written on a frontside of the substrate in a case of the backside of the substrate h |
| 7485879 |
Electron beam writing apparatus and writing method |
February 3, 2009 |
| A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of the electron beam being shot and a maximal shot size thereof based on the input data of |
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