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Takahashi; Shuichi
Shizuoka, JP
No. of patents:

Patent Number Title Of Patent Date Issued
6806019 High-resolution photosensitive resin composition usable with i-line and method of forming patter October 19, 2004
A radiation sensitive resin composition for i-line light exposure comprising an alkaline soluble resin and a quinonediazide group-containing photosensitizer where said alkaline soluble resin comprises a novolak resin and a mixture of one or two or more of resins selected from the gro
6737212 Photosensitive composition May 18, 2004
A radiation sensitive composition useful as a photoresist containing a resin composition and a radiation sensitive material, wherein the resin composition comprises a mixture of two or more resins different from each other by at least 0.03 in refractive index or comprises a resin compone
6537719 Photosensitive resin composition March 25, 2003
A radiation sensitive resin composition which contains a specific amount of a fluorescent material and has high sensitivity, high resolution, excellent highly normalized film remaining characteristics, and capability to form a good pattern. In the case that the radiation sensitive resin

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