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Inventor: Takahashi; Shuichi
Address: Shizuoka, JP
No. of patents: 3
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6806019 |
High-resolution photosensitive resin composition usable with i-line and method of forming patter |
October 19, 2004 |
| A radiation sensitive resin composition for i-line light exposure comprising an alkaline soluble resin and a quinonediazide group-containing photosensitizer where said alkaline soluble resin comprises a novolak resin and a mixture of one or two or more of resins selected from the gro |
| 6737212 |
Photosensitive composition |
May 18, 2004 |
| A radiation sensitive composition useful as a photoresist containing a resin composition and a radiation sensitive material, wherein the resin composition comprises a mixture of two or more resins different from each other by at least 0.03 in refractive index or comprises a resin compone |
| 6537719 |
Photosensitive resin composition |
March 25, 2003 |
| A radiation sensitive resin composition which contains a specific amount of a fluorescent material and has high sensitivity, high resolution, excellent highly normalized film remaining characteristics, and capability to form a good pattern. In the case that the radiation sensitive resin |
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