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Inventor:
Sobukawa; Hirosi
Address:
Zama, JP
No. of patents:
3
Patents:












Patent Number Title Of Patent Date Issued
7408175 Apparatus for inspection with electron beam, method for operating same, and method for manufactu August 5, 2008
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving
7365324 Testing apparatus using charged particles and device manufacturing method using the testing appa April 29, 2008
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25.cndot.1, then forms an image und
7351969 Electron beam inspection system and inspection method and method of manufacturing devices using April 1, 2008
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary ele










 
 
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