| Patent Number |
Title Of Patent |
Date Issued |
| 7785441 |
Plasma generator, plasma control method, and method of producing substrate |
August 31, 2010 |
| The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas 16 are located on the sidewall of a vacuum chamber 11, and a RF power source |
| 7567037 |
High frequency power supply device and plasma generator |
July 28, 2009 |
| A high frequency power supplying device and a plasma generation device using the same includes: two or more inductive antennas; high frequency power sources, respectively supplying power to the antennas; and a vacuum chamber on which the antennas are provided so as to generate a plasma b |
| 7098599 |
Plasma generator |
August 29, 2006 |
| The whole antenna conductor is housed in the interior of a vacuum container of a plasma generator thereby to eliminate the need for an insulating partition or a top plate so that the whole induction field radiated from the antenna can be effectively utilized. Furthermore, the occurre |
| 5122251 |
High density plasma deposition and etching apparatus |
June 16, 1992 |
| A high density ionized plasma is generated in a source chamber using a single loop disposed in a plane that intercepts the central axis of the source chamber perpendicularly or at a lesser angle and spaced from the closed end of the chamber. With a longitudinal magnetic field and an iner |
| 5091049 |
High density plasma deposition and etching apparatus |
February 25, 1992 |
| The high density RF plasma generator of this invention uses special antenna configurations (15) to launch RF waves at low frequency such as 13.56 MHz along a magnetic field supplied by an external magnetic field generator (16.17) in a discharge space (14) where the working gas is introdu |
| 4990229 |
High density plasma deposition and etching apparatus |
February 5, 1991 |
| The high density RF plasma generator of this invention uses special antenna configurations (15) to launch RF waves at low frequency such as 13.56 MHz along a magnetic field supplied by an external magnetic field generator (16.17) in a discharge space (14) where the working gas is introdu |
