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Inventor:
Sendler; Michael
Address:
Migdal H'emek, IL
No. of patents:
1
Patents:












Patent Number Title Of Patent Date Issued
5962065 Method of forming polysilicon having a desired surface roughness October 5, 1999
A method for reliably forming polysilicon of a desired surface roughness includes providing a layer of doped or undoped amorphous silicon on a substrate and heating said substrate while monitoring the emission of said substrate and comparing the monitored emission with an expected emissi










 
 
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