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Inventor: See; Kai-Hung Alex
Address: Singapore, SG
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7553678 |
Method for detecting semiconductor manufacturing conditions |
June 30, 2009 |
| A method for detecting semiconductor-manufacturing conditions includes providing a photomask with a plurality of pattern areas each having a plurality of test lines with different pitches, exposing a plurality of wafer with the photomask in different manufacturing conditions, measuring |
| 7527900 |
Reticle and optical proximity correction method |
May 5, 2009 |
| An OPC method includes providing a primary mask having a primary pattern, forming an assist mask having a correction pattern substantially complementary to the primary pattern, and forming a reticle by overlapping the primary mask and the assist mask. The light transmittance of the c |
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