Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Schroeder; David
Address:
Aurora, IL
No. of patents:
1
Patents:












Patent Number Title Of Patent Date Issued
7803203 Compositions and methods for CMP of semiconductor materials September 28, 2010
The invention provides a composition for chemical-mechanical polishing. The composition comprises an abrasive, a first metal rate polishing modifier agent, a second metal rate polishing modifier agent, and a liquid carrier. In one embodiment, the first metal rate polishing modifier a










 
 
  Recently Added Patents
System for programming domestic appliances and method for programming assembly-line programmable domestic appliances
Photoacoustic joulemeter utilizing beam deflection technique
System for and method of providing single sign-on (SSO) capability in an application publishing environment
Document-related representative information
Liquid crystal display and method of driving the same
Semiconductor device
Method, apparatus or computer program for changing from scheduled to unscheduled communication modes
  Randomly Featured Patents
Method to generate electrical current using a plurality of masses attached to piezoceramic supports
Technique for selective presentation of information in response to a request for information assistance service
Device and method for removing an oblong burr from a molded part
Peptide-based carbon nanotube hair colorants and their use in hair colorant and cosmetic compositions
Method for retaining textured surface of pressed ceiling board
Longitudinally flexible expandable stent
Polymer, process for making the polymer, and rubber composition using the polymer
X-ray device
Imaging apparatus and method for driving the imaging apparatus
Method and kit for detection of multiple protein interactions