Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Sato; Naoyuki
Address:
Kanagawa, JP
No. of patents:
1
Patents:












Patent Number Title Of Patent Date Issued
7858517 Method of manufacturing semiconductor device, and semiconductor device December 28, 2010
First, in a first step, a gate electrode is formed over a silicon substrate, with a gate insulation film therebetween. Next, in a second step, etching with the gate electrode as a mask is conducted so as to dig down a surface layer of the silicon substrate. Subsequently, in a third s










 
 
  Recently Added Patents
Mask and method for forming the mask
Method and system of extending battery life of a wireless microphone unit
Stackable clothes drying apparatus
Catalysts for polyurethane coating compounds
Communication terminal device, communication system, and communication control method
Generating a representation of an object of interest
Signal processing and tiered signal encoding
  Randomly Featured Patents
Method for suppressing DNA fragment amplification during PCR
Grated floorboard for animal housing
Semiconductor memory device
Bonding of solid state device to terminal board
Adjustable length balloon catheter
Storage saver system
Method and apparatus for making load cells less sensitive to off-center load applications
Method of prefabricated construction, and building structure constructed in accordance with such method
Headwear
Method for training of supervised prototype neural gas networks and their use in mass spectrometry