Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Sato; Naoyuki
Address:
Kanagawa, JP
No. of patents:
1
Patents:












Patent Number Title Of Patent Date Issued
7858517 Method of manufacturing semiconductor device, and semiconductor device December 28, 2010
First, in a first step, a gate electrode is formed over a silicon substrate, with a gate insulation film therebetween. Next, in a second step, etching with the gate electrode as a mask is conducted so as to dig down a surface layer of the silicon substrate. Subsequently, in a third s










 
 
  Recently Added Patents
Spray drying vancomycin
Automated tuning in a virtual machine computing environment
Plasma panel based radiation detector
Providing policy-based operating system services in an operating system on a computing system
Method and apparatus for controlling peak amplifier and doherty power amplifier
Semiconductor device having vertical channel
Method and system for triggering message waiting indicator delivery
  Randomly Featured Patents
Fan nozzle
Contact scheme for minimizing inductive pickup in magnetoresistive read heads
Variable displacement pump with communication passage
Process for the production of methanol and a composition suitable for use as a catalyst in said process
Verifiable and accurate service usage monitoring for intermediate networking devices
Shielded syringe
Oil cooler
Programmable timing circuit for testing the cycle time of functional circuits on an integrated circuit chip
Portable sheet bending brake
System and method for vaporizing a cryogenically stored fuel