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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Sasaki; Takahiro
Address:
Tochigi, JP
No. of patents:
9
Patents:




Patent Number Title Of Patent Date Issued
7554649 Projection optical system, exposure apparatus and device fabricating method June 30, 2009
There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surf
7486439 Projection optical system, exposure apparatus and device fabricating method February 3, 2009
There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system comprising six reflective surfaces that include, in order of reflecting light from the object surface, a first reflective sur
7382437 Projection optical system, exposure apparatus and device fabricating method June 3, 2008
There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surf
7324269 Projection optical system, exposure apparatus and device fabricating method January 29, 2008
A projection optical system is provided for projecting a pattern on an object plane onto an image plane in a reduced size. The projection optical system has six reflective surfaces that include, in order of reflecting light from the object plane, a first reflective surface, a second
7226177 Catoptric projection optical system June 5, 2007
A catoptric projection optical system for projecting a pattern on an object surface onto an image surface includes plural mirrors, wherein a second mirror from the image surface through the optical path receives convergent pencil of rays, and has a paraxial magnification of -0.14 or
7161735 Projection optical system, exposure apparatus and device fabricating method January 9, 2007
A projection optical system is provided for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system has six reflective surfaces that include, in order of reflecting light from the object surface, a first reflective surface, a s
7154586 Catoptric projection optical system and exposure apparatus having the same December 26, 2006
A catoptric projection optical system for projecting a reduced size of a pattern on an object surface onto an image surface includes six mirrors that include a first convex mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror in order of reflection
7070289 Catoptric projection optical system July 4, 2006
A catoptric projection optical system for projecting a pattern on an object surface onto an image surface includes plural mirrors, wherein a second mirror from the image surface through the optical path receives convergent pencil of rays, and has a paraxial magnification of -0.14 or
6975385 Projection optical system and exposure apparatus December 13, 2005
A six-mirror catoptric projection optical system for projecting a reduced size of a pattern on an object onto an image plane includes first, second, third, fourth, fifth, and sixth mirrors from the image plane along an optical path, wherein the third and fourth mirrors are located betwee


 
 
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