| Patent Number |
Title Of Patent |
Date Issued |
| 7031364 |
Gas laser device and exposure apparatus using the same |
April 18, 2006 |
| In a gas laser device, a laser gas sealingly stored in a chamber is excited using a discharging electrode that is electrically discharged. Laser light produced by the electrical discharging is totally reflected by a total reflection mirror. An output window partially reflects the las |
| 6795167 |
Projection exposure apparatus and device manufacturing method using the same |
September 21, 2004 |
| A projection exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser, a projection optical system projecting the illuminated pattern onto a substrate, an adjusting device for adjusting an |
| 6727976 |
Exposure apparatus with a pulsed laser |
April 27, 2004 |
| An exposure apparatus comprising (a) irradiating means for illuminating a mask with laser light from an excimer laser and (b) a projection optical system for projecting a pattern of the mask onto a substrate with the laser light, wherein a characteristic of the projection optical system |
| 6646717 |
Projection exposure apparatus and device manufacturing method using the same |
November 11, 2003 |
| A projection exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser, a projection optical system for projecting the illuminated pattern onto a substrate, wherein the projection optical |
| 6348357 |
Exposure apparatus with a pulsed laser |
February 19, 2002 |
| A semiconductor device manufacturing method includes the steps of providing a projection exposure apparatus, exposing a wafer by using the projection exposure apparatus, the exposing step including projecting a circuit pattern onto the wafer through the projection optical system using li |
| 6322220 |
Exposure apparatus and device manufacturing method using the same |
November 27, 2001 |
| An exposure apparatus includes a first dispersing element for dispersing substantially parallel laser light, from a laser, with respect to the wavelength to provide light beams of wavelength units, a first optical system for collecting each light beam of a wavelength unit from the first |
| 6215806 |
Excimer laser generator provided with a laser chamber with a fluoride passivated inner surface |
April 10, 2001 |
| An excimer laser generating system includes a laser chamber whose inner surface is covered with a fluorine-passivated surface. Preferably, the surfaces of a blower and heat exchanger disposed in the laser chamber are also covered with a fluorine-passivated surface. The fluorine-passivate |
| 5969799 |
Exposure apparatus with a pulsed laser |
October 19, 1999 |
| An exposure apparatus comprising (a) irradiating means for illuminating a mask with laser light from an excimer laser and (b) a projection optical system for projecting a pattern of the mask onto a substrate with the laser light, wherein a characteristic of the projection optical system |
| 5949468 |
Light quantity measuring system and exposure apparatus using the same |
September 7, 1999 |
| A light quantity measuring system and an exposure apparatus using the same, wherein the measuring system includes a light intensity measuring device having a plurality of light receiving elements arrayed at least along a scan direction, a scanning mechanism for scanningly moving the ligh |
| 5923693 |
Discharge electrode, shape-restoration thereof, excimer laser oscillator, and stepper |
July 13, 1999 |
| A discharge electrode for an excimer laser oscillator according to the present invention contains oxygen at a content of not more than 10 ppm, and a method of restoring the shape of a discharge electrode according to the present invention comprises introducing an inert gas into a laser |
| 5846678 |
Exposure apparatus and device manufacturing method |
December 8, 1998 |
| An exposure apparatus for transferring, by exposure, a pattern of a mask onto a wafer, includes a pulse light source and a scanning system for relatively and scanningly moving the mask and the wafer relative to an illumination region to be defined by pulses of light to be sequentially |
| 5567928 |
Scanning exposure apparatus and method including controlling irradiation timing of an irradiatio |
October 22, 1996 |
| A scanning type exposure apparatus includes an irradiation source for irradiating an irradiation beam, which has an intensity fluctuation upon a start of irradiation; a scanner for imparting relative movement between the irradiation beam and a mask and a substrate to be exposed to a patt |
