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Inventor: Sakazaki; Tomohiro
Address: Tokyo, JP
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6344655 |
Multicolumn charged-particle beam lithography system |
February 5, 2002 |
| Disclosed is a multicolumn charged-particle beam lithography system having the circuitry of a settlement wait time control unit thereof simplified. The settlement wait time control unit controls a settlement wait time to be spent by each of amplifiers connected to main deflectors necessa |
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