| Patent Number |
Title Of Patent |
Date Issued |
| 5824598 |
IC wiring connecting method using focused energy beams |
October 20, 1998 |
| An IC wiring connecting method for interconnecting conductive lines of the same wiring plane of an IC chip for correcting the wiring, for interconnecting conductive lines of different wiring lanes of a multilayer IC chip at the same position, or for connecting a conductive line of a |
| 5497034 |
IC wiring connecting method and apparatus |
March 5, 1996 |
| An IC wiring connecting method for interconnecting conductive lines of the same wiring plane of an IC chip for correcting the wiring, for interconnecting conductive lines of different wiring lanes of a multilayer IC chip at the same position, or for connecting a conductive line of a |
| 5472507 |
IC wiring connecting method and apparatus |
December 5, 1995 |
| An IC wiring connecting method for interconnecting conductive lines of the same wiring plane of an IC chip for correcting the wiring, for interconnecting conductive lines of different wiring lanes of a multilayer IC chip at the same position, or for connecting a conductive line of a |
| 5113072 |
Device having superlattice structure, and method of and apparatus for manufacturing the same |
May 12, 1992 |
| Disclosed is an apparatus for forming a device having a fine structure, the apparatus including a high intensity ion source. The apparatus can be used to form fine grooves and/or a fine film, by supplying a reactive gas to the surface to be etched or coated while irradiating a focused io |
| 4983540 |
Method of manufacturing devices having superlattice structures |
January 8, 1991 |
| An ion beam (113) focused into a diameter of at most 0.1 .mu.m bombards substantially perpendicularly to the superlattice layers of a one-dimensional superlattice structure and is scanned rectilinearly in a direction of the superlattice layers so as to form at least two parallel groo |
| 4933565 |
Method and apparatus for correcting defects of X-ray mask |
June 12, 1990 |
| The present invention relates to a method and apparatus for correcting defects of an X-ray mask which includes a focused ion beam used to irradiate at least a region having a defective portion of an X-ray mask having a protective film and eliminating the protective film; exposing a c |
| 4925755 |
Method of correcting defect in circuit pattern |
May 15, 1990 |
| A method of correcting a circuit pattern such as an X-ray mask, carried out by first preparing a circuit pattern structure where a circuit pattern on a conductive film is coated with a protective film, then forming a hole or a slit by irradiating a high-intensity focused ion beam to a dr |
| 4868068 |
IC wiring connecting method and resulting article |
September 19, 1989 |
| A IC wiring connecting method for interconnecting conductive lines of the same wiring plane of an IC chip for correcting the wiring, for interconnecting conductive lines of different wiring lanes of a multilayer IC chip at the same position, or for connecting a conductive line of a l |
| 4700225 |
Method and apparatus for testing pattern of a printed circuit board |
October 13, 1987 |
| A method and an apparatus for testing the pattern of a printed circuit board, comprising a stroboscope for emitting intermittent light synchronously with the feed velocity of the printed circuit board; a condenser lens for gathering the intermittent light emitted from the stroboscope |
| 4654583 |
Method and apparatus for detecting defects of printed circuit patterns |
March 31, 1987 |
| A printed circuit pattern inspection system, in which the optical image of circuit patterns is transformed into an electrical signal, the signal is converted into a binary digital signal, the connectivity relationship between selected two points of pattern in the form of binary signal is |
