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Inventor: Russ; Richard D.
Address: Santa Clara, CA
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6244929 |
Chemical-mechanical-polishing system with continuous filtration |
June 12, 2001 |
| A chemical-mechanical-polishing system having a slurry distribution system, a polisher, a deionized water supply, and a drain, includes a slurry filtration system. The filtration system has two filters for alternately filtering particles in slurry and being backflushed with deionized wat |
| 6165048 |
Chemical-mechanical-polishing system with continuous filtration |
December 26, 2000 |
| A chemical-mechanical-polishing system having a slurry distribution system, a polisher, a deionized water supply, and a drain, includes a slurry filtration system. The filtration system has two filters for alternately filtering particles in slurry and being backflushed with deionized wat |
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