| Patent Number |
Title Of Patent |
Date Issued |
| 7463352 |
Method and apparatus for article inspection including speckle reduction |
December 9, 2008 |
| A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing |
| 7399647 |
Multi beam scanning with bright/dark field imaging |
July 15, 2008 |
| Bright and dark field imaging operations in an optical inspection system occur along substantially the same optical path using the same light source by producing either a circular or an annular laser beam. Multiple beam splitting is achieved through the use of a diffractive optical e |
| 7053395 |
Wafer defect detection system with traveling lens multi-beam scanner |
May 30, 2006 |
| A system for inspecting a specimen, such as a semiconductor wafer that uses a laser light source for providing a beam of light. The beam is applied to a traveling lens acousto-optic device having an active region and responsive to an RF input signal to selectively generate plural tra |
| 7049586 |
Multi beam scanning with bright/dark field imaging |
May 23, 2006 |
| Bright and dark field imaging operations in an optical inspection system occur along substantially the same optical path using the same light source by producing either a circular or an annular laser beam. Multiple beam splitting is achieved through the use of a diffractive optical e |
| 6924891 |
Method and apparatus for article inspection including speckle reduction |
August 2, 2005 |
| A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing |
| 6853475 |
Wafer defect detection system with traveling lens multi-beam scanner |
February 8, 2005 |
| A system for inspecting a specimen, such as a semiconductor wafer that uses a laser light source for providing a beam of light. The beam is applied to a traveling lens acousto-optic device having an active region and responsive to an RF input signal to selectively generate plural traveli |
| 6853446 |
Variable angle illumination wafer inspection system |
February 8, 2005 |
| A variable illumination angle inspection system is provided, including a light source providing a light beam and a scanner imparting scanning deflection to the light beam to provide a scanning beam approaching a substrate at a first angle. A deflection element is selectively insertable |
| 6809808 |
Wafer defect detection system with traveling lens multi-beam scanner |
October 26, 2004 |
| A system for inspecting a specimen, such as a semiconductor wafer that uses a laser light source for providing a beam of light. The beam is applied to a traveling lens acousto-optic device having an active region and responsive to an RF input signal to selectively generate plural traveli |
| 6798505 |
Method and apparatus for article inspection including speckle reduction |
September 28, 2004 |
| A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing |
| 6788445 |
Multi-beam polygon scanning system |
September 7, 2004 |
| A polygon scanning system and method is provided wherein two or more light beams impinge at different incident angles on a polygon facet and are sequentially used for scanning the surface of a substrate as the polygon is rotated. Embodiments include a system comprising a polygon having a |
| 6587194 |
Method of and apparatus for article inspection including speckle reduction |
July 1, 2003 |
| A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing |
| 6556294 |
Method of and apparatus for article inspection including speckle reduction |
April 29, 2003 |
| A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing |
| 6429931 |
Method and apparatus for article inspection including speckle reduction |
August 6, 2002 |
| A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing |
| 6369888 |
Method and apparatus for article inspection including speckle reduction |
April 9, 2002 |
| A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing |
| 6185015 |
Compact planar optical correlator |
February 6, 2001 |
| A planar optical correlator including at least first and second optical substrates (30, 32), through which light propagates by means of total internal reflection, at least first and second holographic lenses (20, 22) on the first optical substrate and optical third and fourth holographic |
| 6172778 |
Compact optical crossbar switch |
January 9, 2001 |
| A planar optical crossbar switch comprising two thin planar substrates, on each of which are recorded or attached two holographic lenses between which light propagates by means of total internal reflection. The first lens is a negative cylindrical lens, used to input the incident light |
| 5966223 |
Planar holographic optical device |
October 12, 1999 |
| A holographic optical device having a light transmissive substrate with a first holographic optical element carried by the substrate, and a second holographic optical element also carried by the substrate but laterally offset from the first holographic optical element. The first holograp |
