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Inventor:
Ponnekanti; Hari
Address:
Santa Clara, CA
No. of patents:
6
Patents:












Patent Number Title Of Patent Date Issued
6645303 Heater/lift assembly for high temperature processing chamber November 11, 2003
The present invention provides systems, methods and apparatus for high temperature (at least about 500-800.degree. C.) processing of semiconductor wafers. The systems, methods and apparatus of the present invention allow multiple process steps to be performed in situ in the same cham
6361707 Apparatus and methods for upgraded substrate processing system with microwave plasma source March 26, 2002
An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific
6354241 Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing March 12, 2002
An apparatus and method for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor-processing device. The apparatus includes a vessel chamber having an inlet, an outlet and a fluid conduit between the two that fluidly couples the outlet with
6230652 Apparatus and methods for upgraded substrate processing system with microwave plasma source May 15, 2001
An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific
6045618 Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment April 4, 2000
An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second members having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between
6039834 Apparatus and methods for upgraded substrate processing system with microwave plasma source March 21, 2000
An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific










 
 
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