| Patent Number |
Title Of Patent |
Date Issued |
| 6645303 |
Heater/lift assembly for high temperature processing chamber |
November 11, 2003 |
| The present invention provides systems, methods and apparatus for high temperature (at least about 500-800.degree. C.) processing of semiconductor wafers. The systems, methods and apparatus of the present invention allow multiple process steps to be performed in situ in the same cham |
| 6361707 |
Apparatus and methods for upgraded substrate processing system with microwave plasma source |
March 26, 2002 |
| An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific |
| 6354241 |
Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing |
March 12, 2002 |
| An apparatus and method for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor-processing device. The apparatus includes a vessel chamber having an inlet, an outlet and a fluid conduit between the two that fluidly couples the outlet with |
| 6230652 |
Apparatus and methods for upgraded substrate processing system with microwave plasma source |
May 15, 2001 |
| An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific |
| 6045618 |
Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment |
April 4, 2000 |
| An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second members having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between |
| 6039834 |
Apparatus and methods for upgraded substrate processing system with microwave plasma source |
March 21, 2000 |
| An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific |
