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Pellens; Rudy Jan Maria
Overpelt, BE
No. of patents:

Patent Number Title Of Patent Date Issued
8576374 Lithographic apparatus and method November 5, 2013
According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with r
7892903 Device manufacturing method and substrate comprising multiple resist layers February 22, 2011
A method of producing a T-gate in a single stage exposure process using electromagnetic radiation is disclosed.
7879514 Lithographic method and patterning device February 1, 2011
A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the pa
7626681 Lithographic apparatus and method December 1, 2009
According to an aspect of the present invention, there is provided a lithographic apparatus that includes a substrate carrier arranged to hold a substrate in position using an electrostatic force. The substrate carrier is provided with an integral power source. The apparatus also inc
7494828 Substrate holder and device manufacturing method February 24, 2009
A second substrate, e.g. a III/V compound semiconductor, is placed on a first substrate, e.g. a wafer, in the vicinity of placement marks on the first substrate. The second substrate is exposed to patterned radiation, e.g. for the manufacture of integrated circuits.

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