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Inventor: Pearson; David I. C.
Address: Los Angeles, CA
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 5421891 |
High density plasma deposition and etching apparatus |
June 6, 1995 |
| Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. Surrounding the plasma source are an inner magnetic coil and an outer magnetic coil arranged in the same plane perpendicular to the a |
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