| Patent Number |
Title Of Patent |
Date Issued |
| 7122795 |
Detector optics for charged particle beam inspection system |
October 17, 2006 |
| A charged particle beam column for substrate inspection includes detector optics with high secondary electron detection efficiency combined with minimal distortion of the charged particle beam. One embodiment of the detector optics includes a symmetrizing electrode configured with a |
| 6977375 |
Multi-beam multi-column electron beam inspection system |
December 20, 2005 |
| A multi-column electron beam inspection system is disclosed herein. The system is designed for electron beam inspection of semiconductor wafers with throughput high enough for in-line use. The system includes field emission electron sources, electrostatic electron optical columns, a wafe |
| 6872958 |
Platform positioning system |
March 29, 2005 |
| A system for precisely positioning and moving a platform relative to a support structure is disclosed herein. The platform is particularly suitable for carrying wafers. Charged particle optics can be attached to the support structure. The platform positioning system comprises a stage, |
| 6844550 |
Multi-beam multi-column electron beam inspection system |
January 18, 2005 |
| A multi-column electron beam inspection system is disclosed herein. The system is designed for electron beam inspection of semiconductor wafers with throughput high enough for in-line use. The system includes field emission electron sources, electrostatic electron optical columns, a wafe |
| 6777675 |
Detector optics for electron beam inspection system |
August 17, 2004 |
| An electron beam column incorporating an asymmetrical detector optics assembly provides improved secondary electron collection. The electron beam column comprises an electron gun, an accelerating region, scanning deflectors, focusing lenses, secondary electron detectors and an asymme |
| 6738506 |
Image processing system for multi-beam inspection |
May 18, 2004 |
| An image processing system for use in semiconductor wafer inspection comprises a multiplicity of self-contained image processors for independently performing image cross-correlation and defect detection. The system may also comprise an image normalization engine for performing image |
| 6617587 |
Electron optics for multi-beam electron beam lithography tool |
September 9, 2003 |
| A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, indiv |
| 6316164 |
Proximity effect correction method through uniform removal of fraction of interior pixels |
November 13, 2001 |
| A proximity effect correction method for electron beam lithography suitable for use in a raster scan system. The exposure pattern consists of shapes; these shapes are subdivided into edge pixels and interior pixels; the pattern is then modified by uniformly removing a fraction of the int |
| 5429070 |
High density plasma deposition and etching apparatus |
July 4, 1995 |
| Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. The plasma source may include a sapphire or alumina source tube for use with plasmas containing fluorine. Surrounding the plasma sour |
| 5421891 |
High density plasma deposition and etching apparatus |
June 6, 1995 |
| Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. Surrounding the plasma source are an inner magnetic coil and an outer magnetic coil arranged in the same plane perpendicular to the a |
