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Inventor:
Oosawa; Tetsu
Address:
Sagamihara, JP
No. of patents:
7
Patents:












Patent Number Title Of Patent Date Issued
6358324 Microwave plasma processing apparatus having a vacuum pump located under a susceptor March 19, 2002
A microwave plasma processing apparatus has a process chamber in which an object to be processed is subjected to plasma processing under a predetermined negative pressure environment. A susceptor holding the object thereon is provided in the process chamber. The susceptor is moved by
6032083 Substrate transfer apparatus and heat treatment system using the same February 29, 2000
A substrate transfer apparatus (20) transfers a substrate between a first substrate support member (21) for supporting a plurality of substrates and a second substrate support member (15). This apparatus (20) includes a transfer apparatus main body (60) movable between a first transfer
5984607 Transfer apparatus, transfer method, treatment apparatus and treatment method November 16, 1999
The present invention provides a transfer apparatus and a transfer method capable of reducing the time required for transferring a plurality of to-be-transferred objects, and a treatment apparatus and a treatment method capable of increasing the throughput. The transfer apparatus, wh
5445486 Substrate transferring apparatus August 29, 1995
According to the invention, there is provided a substrate transferring apparatus for transferring substrates from a substrate transport container containing a plurality of substrates to be treated to a substrate holder for holding a plurality of substrates to be treated or vice versa, th
5435683 Load-lock unit and wafer transfer system July 25, 1995
A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened
5405230 Load-lock unit and wafer transfer system April 11, 1995
A load-lock unit is disposed between first and second atmospheres, stores a wafer transferred from the first atmosphere, is blocked off from the first atmosphere, is thereafter set in the same atmosphere as or a similar atmosphere to the second atmosphere, and is opened to communicate wi
5340261 Load-lock unit and wafer transfer system August 23, 1994
A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened










 
 
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