Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Oosawa; Tetsu
Address:
Sagamihara, JP
No. of patents:
7
Patents:












Patent Number Title Of Patent Date Issued
6358324 Microwave plasma processing apparatus having a vacuum pump located under a susceptor March 19, 2002
A microwave plasma processing apparatus has a process chamber in which an object to be processed is subjected to plasma processing under a predetermined negative pressure environment. A susceptor holding the object thereon is provided in the process chamber. The susceptor is moved by
6032083 Substrate transfer apparatus and heat treatment system using the same February 29, 2000
A substrate transfer apparatus (20) transfers a substrate between a first substrate support member (21) for supporting a plurality of substrates and a second substrate support member (15). This apparatus (20) includes a transfer apparatus main body (60) movable between a first transfer
5984607 Transfer apparatus, transfer method, treatment apparatus and treatment method November 16, 1999
The present invention provides a transfer apparatus and a transfer method capable of reducing the time required for transferring a plurality of to-be-transferred objects, and a treatment apparatus and a treatment method capable of increasing the throughput. The transfer apparatus, wh
5445486 Substrate transferring apparatus August 29, 1995
According to the invention, there is provided a substrate transferring apparatus for transferring substrates from a substrate transport container containing a plurality of substrates to be treated to a substrate holder for holding a plurality of substrates to be treated or vice versa, th
5435683 Load-lock unit and wafer transfer system July 25, 1995
A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened
5405230 Load-lock unit and wafer transfer system April 11, 1995
A load-lock unit is disposed between first and second atmospheres, stores a wafer transferred from the first atmosphere, is blocked off from the first atmosphere, is thereafter set in the same atmosphere as or a similar atmosphere to the second atmosphere, and is opened to communicate wi
5340261 Load-lock unit and wafer transfer system August 23, 1994
A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened










 
 
  Recently Added Patents
High electron mobility transistor and manufacturing method thereof
Multi-dimensional credibility scoring
Substituted thiophene pentamers
Laser processing method and apparatus
Nonvolatile semiconductor storage device having conductive and insulative charge storage films
Press nut
Detection system and method for mobile device application
  Randomly Featured Patents
Chip and dip tray
Determining a multi-module dependent parameter at a telecommunication node
Memory device with trimmable power gating capabilities
Methods for clamping and wire-bonding the leads of a lead frame one set at a time
Deep penetrating shear-wave seismic vibratory source for use in marine environments
Mechanically frothed and chemically blown polyurethane foam
Nonvolatile semiconductor memory device
Slotted turner
Forcing tool for locked doors, gates and the like
Type font