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Inventor:
Omura; Yasuhiro
Address:
Kumagaya, JP
No. of patents:
19
Patents:












Patent Number Title Of Patent Date Issued
7701640 Projection optical system and method for photolithography and exposure apparatus and method usin April 20, 2010
An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the
7688517 Projection optical system and method for photolithography and exposure apparatus and method usin March 30, 2010
An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second del
7619827 Projection optical system and method for photolithography and exposure apparatus and method usin November 17, 2009
A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image
7609455 Projection optical system and method for photolithography and exposure apparatus and method usin October 27, 2009
A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of
7580197 Projection optical system and method for photolithography and exposure apparatus and method usin August 25, 2009
A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second
7551362 Projection optical system and method for photolithography and exposure apparatus and method usin June 23, 2009
An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.
7457042 Projection optical system, exposure apparatus, and exposure method November 25, 2008
A projection optical system which uses, for example, an ArF excimer laser beam and can ensure a good imaging performance for an extended period while avoiding the variations in refractive index and the effect of the intrinsic double refraction of a fluorite containing a high-frequency
7362508 Projection optical system and method for photolithography and exposure apparatus and method usin April 22, 2008
Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the o
7348575 Projection optical system, exposure apparatus, and exposure method March 25, 2008
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curva
7312463 Projection optical system, exposure apparatus, and exposure method December 25, 2007
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curva
7309870 Projection optical system, exposure apparatus, and exposure method December 18, 2007
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curva
7154585 Projection optical system, exposure apparatus, and device production method December 26, 2006
Provided is a projection optical system for forming an image of a pattern of a first object (R) on a second object (W). The projection optical system is made of an optical material having a refractive index of not more than 1.6 and is substantially telecentric both on the first object
6909492 Projection optical system, exposure apparatus and exposure method June 21, 2005
Disclosed is a projection optical system having relatively large image-side numerical aperture and projection field and being excellent in mechanical stability in respect of vibrations, and the like. The projection optical system includes a first image-forming optical system for forming
6844982 Projection optical system, exposure system provided with the projection optical system, and expo January 18, 2005
A projection optical system includes a plurality of light-transmissive members and projects an image of a first surface onto a second surface. The projection optical system includes a light-transmissive crystal member made of crystal material. At least one of the light-transmissive cryst
6844915 Optical system and exposure apparatus provided with the optical system January 18, 2005
An optical system attains good optical performance without substantially receiving the effects of birefringence even when using an optical material having intrinsic birefringence. An optical system that includes at least one radiation transmissive member that transmits light having a wav
6831731 Projection optical system and an exposure apparatus with the projection optical system December 14, 2004
A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arra
6788389 Production method of projection optical system September 7, 2004
A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength. The projection optical system having at least one isometric system refractive member made of an isometric system crystal materi
6714280 Projection optical system, projection exposure apparatus, and projection exposure method March 30, 2004
A projection optical system transferring a mask image on a mask onto a substrate and correcting chromatic aberration. A projection exposure system includes at least two refractive optical members collectively containing at least a first fluoride substance and a second fluoride substa
6556353 Projection optical system, projection exposure apparatus, and projection exposure method April 29, 2003
A dioptric projection optical system projects an image of a first surface onto a second surface and includes a first lens group having a negative refractive power and arranged in an optical path between the first surface and the second surface, a second lens group having a positive refra










 
 
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