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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Okudaira; Sadayuki
Address:
Ohme, JP
No. of patents:
5
Patents:












Patent Number Title Of Patent Date Issued
6309980 Semiconductor integrated circuit arrangement fabrication method October 30, 2001
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
6074958 Semiconductor integrated circuit arrangement fabrication method June 13, 2000
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
5962347 Semiconductor integrated circuit arrangement fabrication method October 5, 1999
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
5874013 Semiconductor integrated circuit arrangement fabrication method February 23, 1999
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
4579623 Method and apparatus for surface treatment by plasma April 1, 1986
A gas is introduced into a vacuum chamber after the vacuum chamber is evacuated, and a plasma is generated within at least part of the vacuum chamber. The specimen surface is exposed to the plasma so that the surface is treated. A plurality of different gases, such as SF.sub.6, N.sub.2,










 
 
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