| Patent Number |
Title Of Patent |
Date Issued |
| 7582569 |
Distributor and distributing method, plasma processing system and method, and process for fabric |
September 1, 2009 |
| A distributor (30) includes a square waveguide (31) to be connected to a microwave oscillator (20) and a square waveguide (41) having a plurality of openings (43) formed in a narrow wall (41B). The square waveguide (31) is hollow. A wave delaying member (53) having a relative dielectric |
| 7553459 |
Apparatus and reactor for generating and feeding high purity moisture |
June 30, 2009 |
| A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic re |
| 7521324 |
Semiconductor device and method for manufacturing the same |
April 21, 2009 |
| In order to provide a semiconductor device having good quality by keeping the relative permittivity of a High-K insulation film in a high state, or to provide a method for manufacturing a semiconductor device in which the relative permittivity of the High-K insulation film can be kept in |
| 7500838 |
Vacuum pump with a pair of screw rotors |
March 10, 2009 |
| A vacuum pump, comprising a pair of screw rotors having a first screw rotor with a plurality of spiral land parts and a second screw rotor with a plurality of spiral groove parts and rotating about two axes substantially parallel with each other while engagement with each other, a ca |
| 7449719 |
Semiconductor device and method of manufacturing the same |
November 11, 2008 |
| A gate insulating film is formed using a plasma on a three-dimensional silicon substrate surface having a plurality of crystal orientations. The plasma gate insulating film experiences no increase in interface state in any crystal orientations and has a uniform thickness even at corner |
| 7416165 |
Diaphragm valve for the vacuum exhaustion system |
August 26, 2008 |
| A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body |
| 7368092 |
Apparatus and reactor for generating and feeding high purity moisture |
May 6, 2008 |
| A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic re |
| 7334769 |
Resin molding machine and member for resin molding machine having film in passive state |
February 26, 2008 |
| A member for a resin molding machine wherein it has a face contacting with a molten resin, and at least a part of the face is covered with a film of an oxide of a base material of the face or a component contained in the base material. The use of the member in the molding of a resin allo |
| 7325511 |
Microwave plasma processing apparatus, microwave processing method and microwave feeding apparat |
February 5, 2008 |
| A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveg |
| 7150444 |
Valve with an integral orifice |
December 19, 2006 |
| A valve with an integral orifice for use in gas feeding equipment provided with a pressure-type flow volume control device to be employed for manufacturing of semi-conductors and chemical goods. The valve with an integral orifice has the excellent flow rate control characteristics by |
| 7141756 |
Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma |
November 28, 2006 |
| A microwave plasma processing apparatus is disclosed that enables fast and easy plasma ignition at the pressure for plasma processing In the microwave plasma processing apparatus, a plasma ignition facilitating unit is provided to facilitate plasma ignition induced by a microwave. Th |
| 7080658 |
Method for closing fluid passage, and water hammerless valve device and water hammerless closing |
July 25, 2006 |
| A fluid passage is emergently-closed in a short time without causing a water hammer by an extremely simple device and operation. A water hammerless closing device includes an actuator operated valve provided in a fluid passage, an electro-pneumatic conversion device for supplying a 2 |
| 6964279 |
Pressure-type flow rate control apparatus |
November 15, 2005 |
| A pressure-type flow rate control apparatus controls the flow rate of fluid passing through an orifice to a target flow rate. The flow rate of a compressible fluid under non-critical conditions (sub-sonic) passing through the orifice is calculated by:Also provided is an improved pressure |
| 6903393 |
Semiconductor device fabricated on surface of silicon having <110> direction of crystal pl |
June 7, 2005 |
| In a semiconductor device in which a plurality of field effect transistors are formed on a silicon surface having substantially a <110> orientation, the field effect transistors are disposed on the silicon surface such that a direction connecting a source region and a drain reg |
| 6866747 |
Plasma processing apparatus |
March 15, 2005 |
| On one side of a microwave entrance window that is exposed to the atmosphere, a slot plate having slots and a resonant unit are provided. The slot plate and the resonant unit are integrally placed to be slidable by linear guides with respect to a process chamber. In this way, a plasma |
| 6818852 |
Microwave plasma processing device, plasma processing method, and microwave radiating member |
November 16, 2004 |
| A placement stage (24) on which a semiconductor wafer (W) is place is provided within a processing container (22). A microwave is generated by a microwave generator (76), and the microwave is introduced into a process container (22) through a flat antenna member (66). The flat antenna me |
| 6733732 |
Reactor for generating moisture |
May 11, 2004 |
| A reactor comprising a body made of a heat-resistant material and having an inlet and an outlet for water/moisture gas, having a gas-diffusing member provided in an internal space of the body, and having a platinum coating on an internal wall surface of the body. Hydrogen and oxygen fed |
| 6620290 |
Plasma process apparatus |
September 16, 2003 |
| A plurality of microwave introduction windows are placed at the top wall of the reaction chamber. Microwaves of the same power are introduced into, e.g., two microwave introduction windows that are equivalent in location relationship with respect to the sidewall of the reaction chamber, |
| 6618922 |
Cooperating fixing jigs for aligning a plurality of lower members on a support member |
September 16, 2003 |
| First and second two spacing jigs 81 are used each having a rectangular parallelepipedal body 81a formed on the bottom surface thereof with projections 82 which are arranged side by side at a spacing equal to a predetermined interval between reference bores 106. First, the projections |
| 6527908 |
Plasma process apparatus |
March 4, 2003 |
| A plasma process apparatus capable of preventing generation of plasma in an unwanted location and performing uniform plasma processing with stability is obtained. The plasma process apparatus includes a processing chamber having an internal wall surface; a microwave radiating member havi |
| 6446573 |
Plasma process device |
September 10, 2002 |
| A plasma process device capable of forming homogeneous plasma and coping with a large size substrate less costly can be obtained. The plasma process device includes a processing chamber, microwave guiding means, a shower plate and a reaction gas supply passage. The microwave guiding |
| 6273477 |
Gasket and pipe joint |
August 14, 2001 |
| A pipe joint comprises a pair of tubular joint members, an annular gasket interposed between opposed end faces of the two joint members, and threaded means for joining the two joint members. Each of the joint members is prepared from a stainless steel having a surface with a Vickers |
| 6257270 |
Fluid control device |
July 10, 2001 |
| A fluid control device has formed in a valve main body a main channel communicating with an inlet of a channel within a massflow controller, and a relatively long subchannel and a relatively short subchannel both communicating with the main channel. The process gas to be assure of high |
| 6170890 |
Pipe joint |
January 9, 2001 |
| Each of seal projections 7, 8 is positioned radially outward of an inner periphery 1a, 2a of abutting end face of each of joint members 7, 8 and has in section a contour which comprises a circular-arc portion 7b, 8b extending radially outward from the abutting end face, and a straight |
| 6035893 |
Shutoff-opening devices and fluid control apparatus comprising such devices |
March 14, 2000 |
| A valve main body is internally formed with a main channel extending from a rear end face thereof nearly to a first valve actuator, and two subchannels communicating with the main channel via second and third valve actuators, respectively. The valve main body has a slanting face extendin |
| 5981905 |
System for supervising piping work |
November 9, 1999 |
| A system of the invention for supervising piping work comprises a machine for performing piping work such as welding of pipes or tightening of pipe joints under predetermined conditions, check means for checking whether the piping work has been executed properly based on predetermined va |
| 5975112 |
Fluid control device |
November 2, 1999 |
| A fluid control device has formed in a valve main body a main channel communicating with an inlet of a channel within a massflow controller, and a relatively long subchannel and a relatively short subchannel both communicating with the main channel. The process gas to be assure of high |
| 4976815 |
Draft chamber |
December 11, 1990 |
| A draft chamber is located within a clean room for sequentially immersing and processing carriers such as silicone wafers in a plurality of solution vessels provided in the draft chamber. In the draft chamber, a first air flow moves in a substantially horizontal direction from the front |
