| Patent Number |
Title Of Patent |
Date Issued |
| 7554270 |
Composition for dielectric of plasma display panel, laminate for dielectric, and method for form |
June 30, 2009 |
| A composition for a dielectric of a plasma display panel laminating a plurality of layers, includes: a lower layer composition containing inorganic powder and a binder resin, an upper layer composition containing inorganic powder, a binder resin, a photopolymerizable monomer and a ph |
| 6641628 |
Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrat |
November 4, 2003 |
| Plastic abrasives for sandblasting, in particular, those to be used in sandblast processing for forming barrier ribs and priming ribs; a sandblast processing method with the use of the same; and a method for treating sandblasting waste matters. A plastic abrasive for sandblasting cha |
| 5924912 |
Photosensitive resin composition for sandblast resist |
July 20, 1999 |
| Disclosed is a photosensitive resin composition suitable as a resist material against sandblasting for pattern-wise engraving of the surface of a body after photolithographic patterning, which comprises: (a) a urethane compound having a (meth)acrylate group at the molecular end, which is |
| 5916738 |
Photosensitive resin composition for sandblast resist |
June 29, 1999 |
| Disclosed is a photosensitive resin composition suitable as a resist material against sandblasting for pattern-wise engraving of the surface of a body after photolithographic patterning, which comprises: (a) a urethane compound having a (meth)acrylate group at the molecular end, which is |
| 5756261 |
Photosensitive resin composition for sandblast resist |
May 26, 1998 |
| Disclosed is a photosensitive resin composition suitable as a resist material against sandblasting for pattern-wise engraving of the surface of a body after photo-lithographic patterning, which comprises: (a) a urethane compound having a (meth)acrylate group at the molecular end, whi |
