| Patent Number |
Title Of Patent |
Date Issued |
| 7491474 |
Masks for lithographic imagings and methods for fabricating the same |
February 17, 2009 |
| Masks having various types of structures, such as CPL, HTPSM, or CoG structures, are without positional error with respect to one another by defining positions of the structures on the mask by a single mask lithography step. A patterned absorber layer forms in a first region, the opa |
| 7368385 |
Method for producing a structure on the surface of a substrate |
May 6, 2008 |
| The present invention relates to a method for producing a structure serving as an etching mask on the surface of a substrate. In this case, a first method involves forming a first partial structure on the surface of the substrate, which has structure elements that are arranged regularly |
| 7297468 |
Method for forming a structure element on a wafer by means of a mask and a trimming mask assigne |
November 20, 2007 |
| A method for forming a structure element in a layer arranged on a wafer by a trimming mask set, a developing step, and an etching step for the transfer of the structure pattern are carried out between the exposure steps carried out by the masks. Consequently, edges that are incipiently |
| 7286207 |
Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chroma |
October 23, 2007 |
| A semiconductor wafer is exposed with a pattern from a mask or reticle in an exposure tool. The exposure tool has an adjustable lens system and a light source, which is tunable in wavelength. A first exposure is performed with a tuned first wavelength and a first setting of the lense |
| 7070887 |
Photolithographic mask |
July 4, 2006 |
| A photolithographic mask is based on a combination of a half-tone phase mask and an alternating phase mask such that when radiation passes through some of the openings, a phase difference is in each case produced between adjacent openings, and the surroundings of the openings are par |
| 6730463 |
Method for determining and removing phase conflicts on alternating phase masks |
May 4, 2004 |
| A photoresist layer on a substrate wafer is exposed in first sections with a first exposure radiation and in second sections with a second exposure radiation that is phase-shifted by 180.degree.. The first and second sections adjoin one another in boundary regions in which the photoresis |
| 6680151 |
Alternating phase mask |
January 20, 2004 |
| An alternating phase mask is described in which a propagation of a T phase conflict which occurs in the case of a T pattern structure is avoided by producing a phase jump at one of the 90.degree. corners of the T pattern structure. First and second transparent area segments, which produc |
| 6569772 |
Method for producing an alternating phase mask |
May 27, 2003 |
| A carrier has a surface with a mask layer thereon. An irradiation-sensitive layer on the mask layer is exposed and developed to form a first exposure structure. The first exposure structure is used as an etching mask while the mask layer is etched. The first exposure structure is subsequ |
| 6162556 |
Method for operating a high-temperature fuel cell installation, and a high-temperature fuel cell |
December 19, 2000 |
| The invention relates a method for operating a high-temperature fuel cell installation having a high-temperature fuel cell module. The method includes the step of producing a combustion gas having a combustion gas power for an electrochemical reaction in a high-temperature fuel cell |
| 6162554 |
Method and system for utilizing enthalpy contained in exhaust gases of low-temperature fuel cell |
December 19, 2000 |
| A method for utilizing the heat in the exhaust gases of a low-temperature fuel cell module is disclosed, whereby the exhaust gases from the fuel cell are introduced into a condenser for energy acquisition. A system for the implementation of the inventive method is also disclosed. |
| 6080502 |
Fluid-cooled fuel cell with distribution ducts |
June 27, 2000 |
| The invention relates to a fluid-cooled fuel cell, in which the cell surfaces are supplied with reaction media via axial supply ducts and radial distribution ducts, the distribution ducts being located in the cell surface and running along the edge of the cell surface, with the open |
| 6010798 |
PEM fuel cell |
January 4, 2000 |
| A fuel cell with a proton-conducting membrane, on which catalyst material and a collector are arranged on both sides, is characterized by the following features: on the side facing the membrane (14), the collectors (16,18) are provided with an electrically conductive gas-permeable carbon |
| 5976722 |
Process for operating a fuel cell installation and fuel cell installation for carrying out the p |
November 2, 1999 |
| A process for operating a fuel cell installation and a fuel cell installation for carrying out the process include at least one fuel cell block. A process gas for the fuel cell block is fed into the fuel cell block with a liquid ring compressor. In this way, the process gas is humidi |
| 5629103 |
High-temperature fuel cell with improved solid-electrolyte/electrode interface and method of pro |
May 13, 1997 |
| To improve stability and efficiency of a high-temperature solid-electrolyte fuel cell of planar multilayer design, it is proposed to increase the effective interface between the electrolyte layer and an electrode layer. This is achieved by a suitably treated surface of the electrolyte la |
