| Patent Number |
Title Of Patent |
Date Issued |
| RE38054 |
Reliable, modular, production quality narrow-band high rep rate F2 laser |
April 1, 2003 |
| The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator |
| 7596164 |
Control system for a two chamber gas discharge laser |
September 29, 2009 |
| The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplifie |
| 7567607 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
July 28, 2009 |
| An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge r |
| 7368741 |
Extreme ultraviolet light source |
May 6, 2008 |
| The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extr |
| 7218661 |
Line selected F.sub.2 two chamber laser system |
May 15, 2007 |
| An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master osc |
| 7203216 |
Timing control for two-chamber gas discharge laser system |
April 10, 2007 |
| Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater |
| 7079564 |
Control system for a two chamber gas discharge laser |
July 18, 2006 |
| The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplifie |
| 7061961 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
June 13, 2006 |
| An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge r |
| 7058107 |
Line selected F2 two chamber laser system |
June 6, 2006 |
| An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master osc |
| 7039086 |
Control system for a two chamber gas discharge laser |
May 2, 2006 |
| The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplifie |
| 7002443 |
Method and apparatus for cooling magnetic circuit elements |
February 21, 2006 |
| An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member having at least one core support member wall is disclosed which may comprise a core support coolant inlet; a core support coolant |
| 6985508 |
Very narrow band, two chamber, high reprate gas discharge laser system |
January 10, 2006 |
| An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master osc |
| 6972421 |
Extreme ultraviolet light source |
December 6, 2005 |
| The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme |
| 6914919 |
Six to ten KHz, or greater gas discharge laser system |
July 5, 2005 |
| The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F.sub.2 lasers used for light |
| 6882674 |
Four KHz gas discharge laser system |
April 19, 2005 |
| The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated cir |
| 6865210 |
Timing control for two-chamber gas discharge laser system |
March 8, 2005 |
| Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for |
| 6815700 |
Plasma focus light source with improved pulse power system |
November 9, 2004 |
| The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides |
| 6801560 |
Line selected F2 two chamber laser system |
October 5, 2004 |
| An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master osc |
| 6757316 |
Four KHz gas discharge laser |
June 29, 2004 |
| The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated cir |
| 6744060 |
Pulse power system for extreme ultraviolet and x-ray sources |
June 1, 2004 |
| The present invention provides a pulse power system for extreme ultraviolet and x-ray light sources. The pulse power system produces electrical pulses of at least 12 J at pulse repetition rates of at least 2000 Hz. The system is extremely reliable and has design lifetime substantially in |
| 6690704 |
Control system for a two chamber gas discharge laser |
February 10, 2004 |
| The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplifie |
| 6625191 |
Very narrow band, two chamber, high rep rate gas discharge laser system |
September 23, 2003 |
| An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master osc |
| 6590922 |
Injection seeded F2 laser with line selection and discrimination |
July 8, 2003 |
| A narrow band F.sub.2 laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed beam at a first narrow wavelength range corresponding to a first natural emission line of the F.sub.2 laser system. This beam is injected into the |
| 6586757 |
Plasma focus light source with active and buffer gas control |
July 1, 2003 |
| A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition |
| 6567450 |
Very narrow band, two chamber, high rep rate gas discharge laser system |
May 20, 2003 |
| An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master osc |
| 6566668 |
Plasma focus light source with tandem ellipsoidal mirror units |
May 20, 2003 |
| A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition |
| 6566667 |
Plasma focus light source with improved pulse power system |
May 20, 2003 |
| A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages hi |
| 6556600 |
Injection seeded F2 laser with centerline wavelength control |
April 29, 2003 |
| The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified t |
| 6442181 |
Extreme repetition rate gas discharge laser |
August 27, 2002 |
| A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over prior art designs include: (1) a laser chamber having a gas flow path with a gradually increasing cross |
| 6330261 |
Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
December 11, 2001 |
| The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber, a pulse power syst |
| 6327286 |
High speed magnetic modulator voltage and temperature timing compensation circuit |
December 4, 2001 |
| An improvement over prior art voltage timing compensation circuits is achieved by incorporating a function generator to provide a more accurate non-linear compensation to pulse timing delay, which is typically a non-linear function of voltage. An improvement over prior art temperature |
| 6240112 |
High pulse rate pulse power system with liquid cooling |
May 29, 2001 |
| A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse |
| 6151346 |
High pulse rate pulse power system with fast rise time and low current |
November 21, 2000 |
| A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse |
| 6128323 |
Reliable modular production quality narrow-band high REP rate excimer laser |
October 3, 2000 |
| The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three mo |
| 6028872 |
High pulse rate pulse power system with resonant power supply |
February 22, 2000 |
| A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse |
| 6018537 |
Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser |
January 25, 2000 |
| The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator |
| 6016325 |
Magnetic modulator voltage and temperature timing compensation circuit |
January 18, 2000 |
| An improvement over prior art voltage timing compensation circuits is achieved by incorporating a function generator to provide a more accurate non-linear compensation to pulse timing delay, which is typically a non-linear function of voltage. An improvement over prior art temperature |
| 5991324 |
Reliable. modular, production quality narrow-band KRF excimer laser |
November 23, 1999 |
| A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integ |
| 5949806 |
High voltage cable interlock circuit |
September 7, 1999 |
| A low level current travels from a source through the high voltage cable from the remote end to the local end of the cable in a pulse power circuit. The current is detected, and a signal is generated by a bias sensing circuit. If the low level current is not positively detected, no p |
| 5940421 |
Current reversal prevention circuit for a pulsed gas discharge laser |
August 17, 1999 |
| A simple, novel pulse power circuit is described, which improves the net coupling efficiency of a pulse power system used to drive a gas discharge laser, and minimizes current reversal and electrode erosion. The circuit, in accordance with an embodiment of the present invention, incorpor |
| 5936988 |
High pulse rate pulse power system |
August 10, 1999 |
| A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse |
