| Patent Number |
Title Of Patent |
Date Issued |
| 7566379 |
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma pr |
July 28, 2009 |
| The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minima |
| 7566368 |
Method and apparatus for an improved upper electrode plate in a plasma processing system |
July 28, 2009 |
| The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode |
| 7560083 |
Method for removing water molecules from vacuum chamber, program for executing the method, and s |
July 14, 2009 |
| A method for removing water molecules from a vacuum chamber for carrying out a process on a target object in vacuum includes the steps of introducing into the vacuum chamber a water molecule removal gas including at least a reduction gas which reduces the water molecules to produce h |
| 7553378 |
Substrate cleaning apparatus and method |
June 30, 2009 |
| A substrate cleaning apparatus includes a chamber for accommodating a substrate; a mounting table, disposed in the chamber, for mounting thereon the substrate; an electrode disposed in the mounting table, the substrate being attracted and held on the mounting table as a voltage is ap |
| 7464581 |
Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, a |
December 16, 2008 |
| It is an object to provide a vacuum apparatus capable of evaluating its cleanness precisely by surely monitoring particles including deposits readily detached from the apparatus, and a particle monitoring method and program employed therein, and a window member for particle monitoring.A |
| 7458247 |
Vacuum apparatus including a particle monitoring unit, particle monitoring method, and program |
December 2, 2008 |
| A semiconductor manufacturing apparatus includes a processing chamber for performing a manufacturing processing on a wafer. A gas supply line for introducing a purge gas is connected to an upper portion of the processing chamber, a valve being installed on the gas supply line. A roug |
| 7347006 |
Processing apparatus and method for removing particles therefrom |
March 25, 2008 |
| A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. The first control u |
| 7299104 |
Substrate processing apparatus and substrate transferring method |
November 20, 2007 |
| Shock waves occurring when opening a gate valve between two vacuum chambers and peeling of particles by a viscous force taking place when a gas is supplied into a vacuum chamber are necessary to be suppressed by the apparatus and method of the invention, whereby contamination of a su |
| 7282112 |
Method and apparatus for an improved baffle plate in a plasma processing system |
October 16, 2007 |
| The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate. |
| 7204912 |
Method and apparatus for an improved bellows shield in a plasma processing system |
April 17, 2007 |
| The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows |
| 7166200 |
Method and apparatus for an improved upper electrode plate in a plasma processing system |
January 23, 2007 |
| The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode |
| 7166166 |
Method and apparatus for an improved baffle plate in a plasma processing system |
January 23, 2007 |
| The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate. |
| 7163585 |
Method and apparatus for an improved optical window deposition shield in a plasma processing sys |
January 16, 2007 |
| The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically |
| 7147749 |
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma pr |
December 12, 2006 |
| The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minima |
| 7137353 |
Method and apparatus for an improved deposition shield in a plasma processing system |
November 21, 2006 |
| The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minima |
| 6837966 |
Method and apparatus for an improved baffle plate in a plasma processing system |
January 4, 2005 |
| The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate. |
| 6798519 |
Method and apparatus for an improved optical window deposition shield in a plasma processing sys |
September 28, 2004 |
| The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition sh |
| 6790289 |
Method of cleaning a plasma processing apparatus |
September 14, 2004 |
| There is provided a method of cleaning completely a deposit on the surface of the member to be cleaned, of a plasma processing apparatus without any damage of the coating which has been formed anodized coating or sprayed coating on the surface of the member to cleaned. The method of clea |
