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Inventor:
Nakamura; Fumihiko
Address:
Kanagawa, JP
No. of patents:
5
Patents:




Patent Number Title Of Patent Date Issued
RE38613 Method for growing a nitride compound semiconductor October 5, 2004
A new and improved method for growing a p-type nitride III-V compound semiconductor is provided which can produce a p-type nitride compound semiconductors having a high carrier concentration, without the need for annealing to activate impurities after growth. In a preferred embodiment,
6686611 Nitride semiconductor and a method thereof, a nitride semiconductor device and a method thereof February 3, 2004
In a nitride semiconductor of BpAlqGarInsN (0.ltoreq.p.ltoreq.1, 0.ltoreq.q.ltoreq.1, 0.ltoreq.r.ltoreq.1, 0.ltoreq.s.ltoreq.1, p+q+r+s=1), in particular a p-type nitride compound semiconductor, a point defect concentration of the p-type semiconductors is set to 1.times.10.sup.19 cm.
6429032 Nitride semiconductor and a method thereof, a nitride semiconductor device and a method thereof August 6, 2002
In a nitride semiconductor of BpAlqGarInsN (0.ltoreq.p.ltoreq.1, 0.ltoreq.q.ltoreq.1, 0.ltoreq.r.ltoreq.1, 0.ltoreq.s.ltoreq.1, p+q+r+s=1), in particular a p-type nitride compound semiconductor, a point defect concentration of the p-type semiconductors is set to 1.times.10.sup.19 cm.
6413312 Method for growing a nitride compound semiconductor July 2, 2002
A new and improved method for growing a p-type nitride III-V compound semiconductor is provided which can produce a p-type nitride compound semiconductors having a high carrier concentration, without the need for annealing to activate impurities after growth. In a preferred embodiment,
6043140 Method for growing a nitride compound semiconductor March 28, 2000
A new and improved method for growing a p-type nitride III-V compound semiconductor is provided which can produce a p-type nitride compound semiconductors having a high carrier concentration, without the need for annealing to activate impurities after growth. In a preferred embodiment,


 
 
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