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Inventor: Nagayasu; Hiroshi
Address: Kasuga, JP
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 8133327 |
Substrate processing method, storage medium and substrate processing apparatus |
March 13, 2012 |
| Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is processed with the chemica |
| 8043467 |
Liquid processing apparatus and liquid processing method |
October 25, 2011 |
| A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal |
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