Resources Contact Us Home
Nagayasu; Hiroshi
Kasuga, JP
No. of patents:

Patent Number Title Of Patent Date Issued
8133327 Substrate processing method, storage medium and substrate processing apparatus March 13, 2012
Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is processed with the chemica
8043467 Liquid processing apparatus and liquid processing method October 25, 2011
A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal

  Recently Added Patents
Mobile terminal device capable of more effectively utilizing operation portions, conductive portion, operation detecting unit, power supply unit, and signal processing unit
Semiconductor device
Parasitic element compensation circuit and method for compensating for the parasitic element
Solid-state imaging device, method for manufacturing solid-state imaging device, and electronic apparatus
Methods and apparatus for adapting network characteristics in telecommunications systems
Video conference
Snap-engagement structure
  Randomly Featured Patents
Process for producing a laminate of metal with thermoplastic material
Resource allocation to non-critical users
Java automation, testing, and analysis
Front bezel with light-guiding device
Toy assembly having toy pieces that are slidable along a slender track member
Multi-dimensional real-time ultrasonic blood flow imaging apparatus and method
Spectralfluorometer arrangement
Controlling over voltage on a charge pump power supply node
Apparatus for vacuum collection and compacting of leaves and grass clippings
Process for the production of concrete switch cross ties