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Nagayasu; Hiroshi
Kasuga, JP
No. of patents:

Patent Number Title Of Patent Date Issued
8133327 Substrate processing method, storage medium and substrate processing apparatus March 13, 2012
Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is processed with the chemica
8043467 Liquid processing apparatus and liquid processing method October 25, 2011
A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal

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