Resources Contact Us Home
Nagayasu; Hiroshi
Kasuga, JP
No. of patents:

Patent Number Title Of Patent Date Issued
8133327 Substrate processing method, storage medium and substrate processing apparatus March 13, 2012
Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is processed with the chemica
8043467 Liquid processing apparatus and liquid processing method October 25, 2011
A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal

  Recently Added Patents
Progressively discovering and integrating services
System, method and program recording medium for supply capacity estimation
Emergency call notification for network services
Data storage apparatus, memory control apparatus and method for controlling flash memories
Manufacturing method for semiconductor device carrier and semiconductor package using the same
Control method and allocation structure for flash memory device
Solar cell with hyperpolarizable absorber
  Randomly Featured Patents
Exterior supported self-expanding stent-graft
Optical jog wheel with spiral coding element
Method and system for frequency scan using a differential power metric
Semiconductor apparatus, solid state image pickup device using the same, and method of manufacturing them
Presetting for cold-roll reversal stand
Magnetic assembly for a transducer
Diagnostic methods using neurite growth regulatory factors
Pneumatically powered strapping tool
Method for the preparation of a selected protein or a part thereof in Bacillus strain bacteria
Portable display device