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Inventor:
Nagaike; Hiroshi
Address:
Nirasaki, JP
No. of patents:
13
Patents:












Patent Number Title Of Patent Date Issued
8578952 Substrate processing system, substrate surface processing apparatus, substrate surface inspectin November 12, 2013
A substrate processing system which enables a minute piece of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing
8243265 Method and apparatus for detecting foreign materials and storage medium August 14, 2012
A foreign material detecting method for detecting a foreign material attached to a substrate surface includes a spraying step of spraying an organic solvent or an oil-phase material containing a halogen element to the substrate surface, a condensing step of emphasizing the foreign ma
8206513 Method for cleaning elements in vacuum chamber and apparatus for processing substrates June 26, 2012
To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles an
8172949 Substrate processing apparatus, program for performing operation and control method thereof, and May 8, 2012
A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valve is opened while the
8137473 Method for cleaning elements in vacuum chamber and apparatus for processing substrates March 20, 2012
To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles an
8052798 Particle removal apparatus and method and plasma processing apparatus November 8, 2011
A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, includes a particle
8043971 Plasma processing apparatus, ring member and plasma processing method October 25, 2011
[Problem to be Solved] In a plasma processing apparatus for executing a process using plasma, promoting the sharing of an apparatus in executing a plurality of different processes and plasma states amongst apparatuses in executing same processes in a plurality of apparatuses are provided
7976637 Substrate processing system, substrate surface processing apparatus, substrate surface inspectin July 12, 2011
A substrate processing system which enables a minute pieces of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing
7780786 Internal member of a plasma processing vessel August 24, 2010
An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which includes at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca,
7756599 Substrate processing apparatus, program for performing operation and control method thereof, and July 13, 2010
A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valve is opened while the
7651586 Particle removal apparatus and method and plasma processing apparatus January 26, 2010
A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, includes a particle
7560083 Method for removing water molecules from vacuum chamber, program for executing the method, and s July 14, 2009
A method for removing water molecules from a vacuum chamber for carrying out a process on a target object in vacuum includes the steps of introducing into the vacuum chamber a water molecule removal gas including at least a reduction gas which reduces the water molecules to produce h
7347006 Processing apparatus and method for removing particles therefrom March 25, 2008
A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. The first control u










 
 
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