Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Murakami; Takeshi
Address:
Tokyo, JP
No. of patents:
56
Patents:


1 2










Patent Number Title Of Patent Date Issued
8124933 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted February 28, 2012
An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for o
8076654 Sample surface inspection apparatus and method December 13, 2011
The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the su
8067732 Electron beam apparatus November 29, 2011
An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured suc
8053726 Inspection system by charged particle beam and method of manufacturing devices using the system November 8, 2011
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the elec
8013315 Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufa September 6, 2011
A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjust
8003963 Extreme ultraviolet light source apparatus August 23, 2011
An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ult
7977466 C-glycoside derivatives and salts thereof July 12, 2011
The present invention provides C-glycoside derivatives and salts thereof, wherein B ring is bonded to A ring via --X-- and A ring is directly bonded to the glucose residue, and it is usable as a Na.sup.+-glucose cotransporter inhibitor, especially for a therapeutic and/or preventive
7952071 Apparatus and method for inspecting sample surface May 31, 2011
Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device. Provided is a method for inspe
7928378 Apparatus for inspection with electron beam, method for operating same, and method for manufactu April 19, 2011
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving
7863580 Electron beam apparatus and an aberration correction optical apparatus January 4, 2011
An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 .mu.m with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample
7855364 Projection electronic microscope for reducing geometric aberration and space charge effect December 21, 2010
A projection electronic microscope is provided for improving geometric aberration and a space charge effect within a zooming range using a zoom type transfer lens system in a projection/image formation optical system. The projection electronic microscope comprises an irradiation system f
7772407 C-glycoside derivatives and salts thereof August 10, 2010
The present invention provides C-glycoside derivatives and salts thereof, wherein B ring is bonded to A ring via --X-- and A ring is directly bonded to the glucose residue, and it is usable as a Na.sup.+-glucose cotransporter inhibitor, especially for a therapeutic and/or preventive
7745784 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus June 29, 2010
The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron bea
7741601 Testing apparatus using charged particles and device manufacturing method using the testing appa June 22, 2010
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25.cndot.1, then forms an image und
7592586 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflect September 22, 2009
An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for o
7569838 Electron beam inspection system and inspection method and method of manufacturing devices using August 4, 2009
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary ele
7521692 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device an April 21, 2009
An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which
7449691 Detecting apparatus and device manufacturing method November 11, 2008
A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wh
7425703 Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evalu September 16, 2008
An object of the present invention is to provide an electron beam apparatus, in which a plurality of electron beams, e.g., four electron beams, is produced for one optical axis with a relatively high current achieved for each electron beam.Provided is an electron beam apparatus compr
7420164 Objective lens, electron beam system and method of inspecting defect September 2, 2008
An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which ca
7411191 Inspection system by charged particle beam and method of manufacturing devices using the system August 12, 2008
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the elec
7408175 Apparatus for inspection with electron beam, method for operating same, and method for manufactu August 5, 2008
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving
7391036 Sample surface inspection apparatus and method June 24, 2008
The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the su
7385197 Electron beam apparatus and a device manufacturing method using the same apparatus June 10, 2008
Disclosed is an electron beam apparatus, in which a plurality of electron beams is formed from electrons emitted from an electron gun 21 and used to irradiate a sample surface via an objective lens 28, said apparatus comprising: a beam separator 27 for separating a secondary electron bea
7361895 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus April 22, 2008
An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing
7352195 Electron beam apparatus with detailed observation function and sample inspecting and observing m April 1, 2008
Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface a
7351969 Electron beam inspection system and inspection method and method of manufacturing devices using April 1, 2008
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary ele
7312449 Electron beam system and method of manufacturing devices using the system December 25, 2007
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted fro
7285010 TDI detecting device, a feed-through equipment and electron beam apparatus using these devices October 23, 2007
An electron beam apparatus comprises a TDI sensor (64) and a feed-through device (50). The feed-through device has a socket contact (54) for interconnecting a pin (52) attached to a flanged (51) for separating different environments. The. other pin (53) making a pair with the pin (52
7256405 Sample repairing apparatus, a sample repairing method and a device manufacturing method using th August 14, 2007
An object of the present invention is to provide a sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method, which can reduce an edge roughness in a repaired pattern and also can provide the repairing of a sample by applying an ele
7247848 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus July 24, 2007
The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron bea
7241993 Inspection system by charged particle beam and method of manufacturing devices using the system July 10, 2007
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the elec
7223973 Apparatus for inspection with electron beam, method for operating same, and method for manufactu May 29, 2007
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving
7212017 Electron beam apparatus with detailed observation function and sample inspecting and observing m May 1, 2007
Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface a
7202350 C-glycoside derivatives and salts thereof April 10, 2007
The present invention provides C-glycoside derivatives and salts thereof, wherein B ring is bonded to A ring via --X-- and A ring is directly bonded to the glucose residue, and it is usable as a Na.sup.+-glucose cotransporter inhibitor, especially for a therapeutic and/or preventive
7176459 Electron beam apparatus February 13, 2007
An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-.theta. stage through an electrostatic lens, an objective lens and the like, secondary
7157703 Electron beam system January 2, 2007
Provided is an electron beam system, in which an electron beam emitted from an electron gun is irradiated to a stencil mask, and the electron beam that has passed through the stencil mask is magnified by an electron lens and then detected by a detector having a plurality of pixels so as
7138629 Testing apparatus using charged particles and device manufacturing method using the testing appa November 21, 2006
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25.cndot.1, then forms an image und
7075072 Detecting apparatus and device manufacturing method July 11, 2006
A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wh
7005641 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus February 28, 2006
An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing
6992290 Electron beam inspection system and inspection method and method of manufacturing devices using January 31, 2006
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary ele
6855929 Apparatus for inspection with electron beam, method for operating same, and method for manufactu February 15, 2005
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving
6853143 Electron beam system and method of manufacturing devices using the system February 8, 2005
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted fro
6593152 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus July 15, 2003
The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams e
6282368 Liquid feed vaporization system and gas injection device August 28, 2001
A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO.sub.3, SrTiO.sub.3 and other
6269221 Liquid feed vaporization system and gas injection device July 31, 2001
A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO.sub.3, SrTiO.sub.3 and other
6195504 Liquid feed vaporization system and gas injection device February 27, 2001
A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO.sub.3, SrTiO.sub.3 and others
6176929 Thin-film deposition apparatus January 23, 2001
A compact thin-film deposition apparatus can promote a stable growth of a high quality thin-film product of uniform quality. The apparatus comprises a vacuum-tight deposition chamber enclosing a substrate holding device for holding a substrate. An elevator device for moving the substrate
6132512 Vapor-phase film growth apparatus and gas ejection head October 17, 2000
A vapor-phase film growth apparatus includes a substrate holder for holding a substrate, a gas ejection head, and a radiant heat shield device. The substrate holder has a substrate heater therein, and the gas ejection head has a gas injection surface for ejecting a material gas toward a
6036783 Liquid material vaporizer apparatus and gas ejection device March 14, 2000
A vaporizer apparatus enables efficient vaporization of a liquid material for the production of high dielectric thin film devices by allowing a sufficient dwell time for complete vaporization of the feed liquid. The vaporizer apparatus also prevents degradation of the feed gas after
1 2










 
 
  Recently Added Patents
System for seeking for an optimal configuration of a bi-, tri- or multi-ventricular cardiac resynchronization implanted device
Strongly bound carbon nanotube arrays directly grown on substrates and methods for production thereof
Method and system for using personal devices for authentication and service access at service outlets
Near-field transducers for focusing light
Mobile tablet information handling system support
Method and apparatuses for solving weighted planar graphs
Wild card auto completion
  Randomly Featured Patents
Shifting device
Disk drive comprising a spindle motor employing anionic/cationic lubricant to reduce disk surface potential
Carriage optics system for optical data storage system
Mobile phone
Gable top paperboard container with tactile indicia indicating opening spout
Trunk ventilator
Method and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
Method for manufacturing semiconductor substrate, and semiconductor device
Process for preparation of hydroxyapatite coatings
Turf simulating surface