| Patent Number |
Title Of Patent |
Date Issued |
| 7628864 |
Substrate cleaning apparatus and method |
December 8, 2009 |
| A substrate cleaning apparatus includes a chamber for accommodating a substrate; a mounting table, disposed in the chamber, for mounting thereon the substrate; an electrode disposed in the mounting table, the substrate being attracted and held on the mounting table as a voltage is ap |
| 7560083 |
Method for removing water molecules from vacuum chamber, program for executing the method, and s |
July 14, 2009 |
| A method for removing water molecules from a vacuum chamber for carrying out a process on a target object in vacuum includes the steps of introducing into the vacuum chamber a water molecule removal gas including at least a reduction gas which reduces the water molecules to produce h |
| 7553378 |
Substrate cleaning apparatus and method |
June 30, 2009 |
| A substrate cleaning apparatus includes a chamber for accommodating a substrate; a mounting table, disposed in the chamber, for mounting thereon the substrate; an electrode disposed in the mounting table, the substrate being attracted and held on the mounting table as a voltage is ap |
| 7464581 |
Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, a |
December 16, 2008 |
| It is an object to provide a vacuum apparatus capable of evaluating its cleanness precisely by surely monitoring particles including deposits readily detached from the apparatus, and a particle monitoring method and program employed therein, and a window member for particle monitoring.A |
| 7458247 |
Vacuum apparatus including a particle monitoring unit, particle monitoring method, and program |
December 2, 2008 |
| A semiconductor manufacturing apparatus includes a processing chamber for performing a manufacturing processing on a wafer. A gas supply line for introducing a purge gas is connected to an upper portion of the processing chamber, a valve being installed on the gas supply line. A roug |
| 7416635 |
Gas supply member and plasma processing apparatus |
August 26, 2008 |
| A gas supply member is disposed in a chamber of a plasma processing apparatus and has a planar surface facing an inner space of the chamber and a plurality of gas holes bored in the planar surface to supply a gas through the gas holes to the inner space. An outer periphery portion of |
| 7347006 |
Processing apparatus and method for removing particles therefrom |
March 25, 2008 |
| A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. The first control u |
| 7299104 |
Substrate processing apparatus and substrate transferring method |
November 20, 2007 |
| Shock waves occurring when opening a gate valve between two vacuum chambers and peeling of particles by a viscous force taking place when a gas is supplied into a vacuum chamber are necessary to be suppressed by the apparatus and method of the invention, whereby contamination of a su |
| 7245364 |
Apparatus for inspecting a surface of an object to be processed |
July 17, 2007 |
| An apparatus for inspecting a surface of an object to be processed includes at least one irradiation unit for irradiating a light on the surface of the object; at least one detection unit for detecting a light scattered from the surface of the object in response to the irradiated lig |
