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Mori; Kiyoto
Soka, JP
No. of patents:

Patent Number Title Of Patent Date Issued
7084097 Cleaning solution for substrates of electronic materials August 1, 2006
The present invention relates to a cleaning solution capable of removing efficiently at the same time particles and metallic impurities from a substrate surface without corroding metallic materials.The cleaning solution for cleaning substrates of electronic materials comprises an org
6914039 Etching liquid composition July 5, 2005
The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more compounds selected from
5326490 Surface tension sulfuric acid composition July 5, 1994
Sulfuric acid or sulfuric acid/hydrogen peroxide cleaning solutions used in semiconductor manufacturing processes are improved in wettability and cleaning effect by lowering their surface tension through the addition of surface-active agents Of the general formula R.sup.1 SO.sub.2 NR.sup

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