Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Mizutani; Tatsumi
Address:
Koganei, JP
No. of patents:
16
Patents:












Patent Number Title Of Patent Date Issued
7049243 Surface processing method of a specimen and surface processing apparatus of the specimen May 23, 2006
A plasma processing method for etching a sample having a gate oxide film which generates a plasma in a vacuum chamber using electromagnetic waves, applies an rf bias power to the sample, turns off the rf bias power before a charged voltage of the sample reaches a breakdown voltage of the
6849191 Method and apparatus for treating surface of semiconductor February 1, 2005
According to the present invention, there is provided a sample surface treating apparatus for processing a fine pattern by plasma etching, including a stage provided in a chamber, on which a sample to be subjected to a surface treatment is placed; etching gas supply source for contin
6767838 Method and apparatus for treating surface of semiconductor July 27, 2004
A method and apparatus of treating a surface of a sample. A sample is arranged on a stage provided in a chamber, an etching gas is continuously supplied into the chamber and a plasma is generated from the etching gas. An rf bias at a frequency of 100 kHz or higher is applied to the stage
6677244 Specimen surface processing method January 13, 2004
A plasma processing method for etching a sample having a gate oxide film includes generating a plasma in a vacuum chamber using electromagnetic waves, applying an rf bias power to the sample, turning off the rf bias power before a charged voltage of the sample reaches a breakdown voltage
6492277 Specimen surface processing method and apparatus December 10, 2002
Electrical damage to semiconductor elements in the plasma etching thereof is suppressed. In processing of a fine pattern by plasma etching, the high frequency power supply to be applied to the specimen is turned off before the charge potential at a portion of the pattern reaches the brea
6309980 Semiconductor integrated circuit arrangement fabrication method October 30, 2001
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
6231777 Surface treatment method and system May 15, 2001
A pulse voltage of duty ratio 5% or below and repetition frequency 400 KHz or above is supplied in order to suppress the notch, charge build-up damage, subtrench and bowing due to the electron shading phenomenon. Thus, a cycle for accelerating electrons occurs in the substrate bias, so t
6074958 Semiconductor integrated circuit arrangement fabrication method June 13, 2000
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
5962347 Semiconductor integrated circuit arrangement fabrication method October 5, 1999
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
5874013 Semiconductor integrated circuit arrangement fabrication method February 23, 1999
To realize etching with a high selection ratio and a high accuracy in fabrication of an LSI, the composition of dissociated species of a reaction gas is accurately controlled when dry-etching a thin film on a semiconductor substrate by causing an inert gas excited to a metastable sta
5554257 Method of treating surfaces with atomic or molecular beam September 10, 1996
A molecular or atomic beam for cleaning or etching semiconductor substrates, or for forming a thin film on a semiconductor substrate is formed by generating a chemical reaction between at least two gases introduced into a reaction chamber. The products of the chemical reaction, and o
5462635 Surface processing method and an apparatus for carrying out the same October 31, 1995
A surface processing method capable of processing the surface of a work at a high processing rate without damaging the surface of the work uses, in combination, a fast processing technique using charged particles and a moderate processing technique using neutral particles that scarcely d
5284544 Apparatus for and method of surface treatment for microelectronic devices February 8, 1994
An apparatus for surface treatment according to the present invention used for carrying out dry etching, thin film deposition and so forth is provided with a neutral beam etching apparatus in order to improve etching rate. In an embodiment, microwave wave-guides forming a duplex tube, a
5241186 Surface treatment method and apparatus therefor August 31, 1993
A method of preventing damages of a semiconductor having an insulator film at its surface caused by holes induced in the insulator film and move to and are trapped at or near the interface between the insulator film and a substrate upon applying surface treatment for the surface of the
5140272 Method of semiconductor surface measurment and an apparatus for realizing the same August 18, 1992
A method of semiconductor surface measurement for measuring electrical characteristics of a surface of a semiconductor body is disclosed, by which an electrode, whose surface, which is opposite to the surface of a semiconductor substrate, is flat and the gap between the electrode and the
5108778 Surface treatment method April 28, 1992
Disclosed are a surface treatment method and apparatus in which an active species beam that contains active species having translational energy in a range of 0.01-100 eV as at least a partial constituent thereof constructs at least a part of treatment means.










 
 
  Recently Added Patents
Information obtaining and notification, data message forwarding and handover method and access node
Dynamic allocation of access channels based on access channel occupancy in a cellular wireless communication system
Developing device
Multiplanar image displays and media formatted to provide 3D imagery without 3D glasses
Methods and devices for enforcing network access control utilizing secure packet tagging
Scanning optical positioning system with spatially triangulating receivers
Pizza stone
  Randomly Featured Patents
Hemoglobin contrast in magneto-motive optical doppler tomography, optical coherence tomography, and ultrasound imaging methods and apparatus
Method and article for protecting a precipitator discharge electrode
Cushion for a bathtub
Methodology for in-situ doping of aluminum coatings
Telescoping handle
Interface equipment between a heat pump and a buried heat exchanger
Cable connector having interchangeable color bands
Energy efficient waveform generation using tuned resonators
Tine raking device
Methods and systems for content-consumption device monitoring and control