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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Mizutani; Kazuyoshi
Address:
Shizuoka, JP
No. of patents:
61
Patents:


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Patent Number Title Of Patent Date Issued
8142977 Positive resist composition and pattern forming method using the same March 27, 2012
A positive resist composition, includes: (B1) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (B1) in an aqueous alkali solution, the resin (B1) containing a specific hydroxystyrene-based repeating unit and/or (meth)acrylic acid-based r
8092977 Positive resist composition and pattern forming method using the same January 10, 2012
A positive resist composition, includes: (A) a resin having a repeating unit represented by formula (A) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (A) in an alkali developer; and a pattern forming method uses the
8034547 Pattern forming method, resist composition to be used in the pattern forming method, negative de October 11, 2011
A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative de
8017304 Pattern forming method, and resist composition, developer and rinsing solution used in the patte September 13, 2011
A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less a
7989137 Resist composition and pattern-forming method using the same August 2, 2011
A resist composition includes (A) a resin including: a repeating unit capable of decomposing by the action of an acid to increase solubility in an alkali developing solution and represented by formula (I), and a repeating unit represented by formula (II); and (B) a compound capable of
7923196 Positive resist composition and pattern forming method using the same April 12, 2011
A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic
7807329 Photosensitive composition and pattern-forming method using the same October 5, 2010
A photosensitive composition comprises (A) a specific compound, which is excellent in sensitivity, resolution, and defocus latitude (DOF), and a pattern-forming method using the photosensitive composition is provided.
7645557 Positive resist composition for immersion exposure and pattern forming method using the same January 12, 2010
A positive resist composition, comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin having a repeating unit containing at least one alicyclic structure, of which solubility in an alkali developer increases under an acti
7625690 Positive resist composition and pattern forming method using the same December 1, 2009
A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: ##STR00001## wherein AR represents an aryl group; Rn represents an alkyl group, a
7592118 Positive resist composition and pattern forming method using the same September 22, 2009
A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compoun
7521168 Resist composition for electron beam, EUV or X-ray April 21, 2009
A resist composition for an electron beam, EUV or X-ray comprising (A1) a compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation.
7374860 Positive resist composition and pattern forming method using the same May 20, 2008
The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the line edge roughness is small and the surface roughness is satisfied, and a pattern formi
7344821 Positive resist composition for use with electron beam, EUV light or X ray, and pattern formatio March 18, 2008
A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increases a solubility of the
7335454 Positive resist composition February 26, 2008
A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali d
7326513 Positive working resist composition February 5, 2008
A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or sparingly soluble
7250246 Positive resist composition and pattern formation method using the same July 31, 2007
A positive resist composition which can be suitably used in an ultramicrolithography process such as production of VLSI or high-capacity microchip and in other photofabrication processes and can ensure good sensitivity, resolution, pattern profile and line edge roughness when irradia
7232640 Positive resist composition June 19, 2007
A positive resist composition comprising a polymer capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin comprises repeating units containing at least two special types of acetal structures separately, a compound capable of generating an a
7217493 Positive resist composition May 15, 2007
A positive resist composition comprising (A) polysiloxane or polysilsesquioxane that has a property of increasing solubility in an alkali developing solution by the action of an acid and contains a group capable of being decomposed with an acid, (B) a compound that generates a sulfon
7214467 Photosensitive resin composition May 8, 2007
The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F.sub.2 excimer laser light, where line edge roughness a
7202015 Positive photoresist composition and pattern making method using the same April 10, 2007
A positive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase
7198880 Positive resist composition April 3, 2007
A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali
7195856 Positive resist composition and pattern formation method using the same March 27, 2007
A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and a
7163776 Positive-working resist composition January 16, 2007
A positive-working resist composition comprising (A1) a resin containing a repeating unit represented by the specific general formula, wherein the resin increases the solubility in an alkali developing solution by the action of an acid.
7160666 Photosensitive resin composition January 9, 2007
A photosensitive resin composition of the present invention comprises (A) a resin having a repeating unit represented by formula (IA) and a repeating unit containing an acid decomposable group and copolymerizable with formula (IA), which is decomposed under the action of an acid to i
7157208 Positive resist composition and pattern forming method using the same January 2, 2007
A positive resist composition satisfying all of high sensitivity, high resolution, good pattern profile, good line edge roughness and good in-vacuum PED characteristics, is provided, the positive resist composition comprising: (A) a resin containing a repeating unit having a specific
7147987 Positive resist composition and pattern formation method using the same December 12, 2006
A positive resist composition comprising (A) a compound that generates an acid upon irradiation of an actinic ray or radiation and (B) a resin having a property of increasing solubility in an alkali developing solution by the action of an acid and including a repeating unit containin
7138217 Positive resist composition November 21, 2006
A positive resist composition comprises: (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A)
7108951 Photosensitive resin composition September 19, 2006
The photosensitive resin composition comprising: (A) a resin containing (A1) a repeating unit having at least two groups represented by the specific general formula; and (B) a compound capable of generating an acid by the action with one of an actinic ray and a radiation.
7105273 Positive resist composition September 12, 2006
A positive resist composition of the present invention achieving significant performance improvements in high energy-beam lithography, which comprises a phenolic polymer having a property of being insoluble or hardly soluble in an aqueous alkali solution and becoming soluble in an aq
7083892 Resist composition August 1, 2006
The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV light, which comprising (A) a compound h
6939662 Positive-working resist composition September 6, 2005
A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation wi
6902862 Resist composition June 7, 2005
A negative type resist composition comprising: (A1) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific formula, (A2) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the speci
6878502 Positive resist composition April 12, 2005
A positive resist composition comprises (A) a resin which comprises a specified repeating units and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation.
6852467 Positive resist composition February 8, 2005
A positive resist composition comprising: (A) a fluorine group-containing resin having: a structure wherein at least one of the main chain and the side chain of the polymer skeleton has at least one fluorine atom; and having a group capable of decomposing under the action of an acid t
6830871 Chemical amplification type resist composition December 14, 2004
A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility in an alkaline developing solution by the action of an acid, (b) a compound capable of ge
6811947 Positive resist composition November 2, 2004
A positive resist composition comprising (A) a resin, which is decomposed by the action of an acid to increase solubility in an alkali developing solution, having a repeating unit represented by formula (Y) defined in the specification, (B) a compound capable of generating an acid upon
6808869 Bottom anti-reflective coating material composition and method for forming resist pattern using October 26, 2004
A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective l
6777161 Lower layer resist composition for silicon-containing two-layer resist August 17, 2004
To provide a lower layer resist composition for a silicon-containing two-layer resist, which is excellent in the dry etching resistance and film thickness uniformity.A lower layer resist composition for a silicon-containing two-layer resist, comprising (a) a phenol-based polymer, (b) a c
6743565 Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene June 1, 2004
A positive resist composition is disclosed, comprising (A) a resin containing at least one repeating unit represented by the following formula (I) and at least one repeating unit represented by formula (VII), which decomposes under the action of an acid to increase the solubility in
6727040 Positive resist composition to be irradiated with one of an electron beam and X-ray April 27, 2004
A positive resist composition to be irradiated with one of an electron beam and X-ray, comprises: (a) a compound capable of generating an acid upon irradiation with one of electron beam and X-ray; (b1) a resin: increasing the solubility in an alkali developer by the action of an acid; an
6589705 Positive-working photoresist composition July 8, 2003
A positive-working photoresist composition comprises (A) a resin comprising the specific repeating structural units which resin increases in its solubility in an alkaline developer when acted upon by an acid, (B') an onium salt compound which generates an acid when irradiated with active
6555289 Positive photoresist composition April 29, 2003
Provided is a positive photoresist composition for use in the production of a semiconductor device, which ensures high resolution, reduced edge roughness of a line pattern and a small number of development defects. The positive photoresist composition comprises a resin having a specific
6506535 Positive working photoresist composition January 14, 2003
Disclosed is a positive working photoresist composition comprising an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), and also disclosed is
6479213 Positive photoresist composition November 12, 2002
Disclosed is a positive photoresist composition comprising an alkali-soluble polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I') and a positive photoresist composition comprising an acid-decomposable polysiloxan
6399269 Bottom anti-reflective coating material composition for photoresist and method of forming resist June 4, 2002
A bottom anti-reflective coating material composition for a photoresist comprising the following components (a) to (d):(a) a polymer containing a dye structure having a molar extinction coefficient of 1.0.times.10.sup.4 or more to light including a wavelength used for exposure of the pho
6387590 Positive photoresist composition May 14, 2002
Disclosed is a positive photoresist composition comprising a polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I): ##STR1##wherein L represents a single bond or an arylene group, A' represents an aromacyclic or al
6346363 Positive photoresist composition February 12, 2002
A positive type photoresist composition comprising an alkali-soluble or acid-decomposable polysiloxane containing repeating structural units represented by formula (I): ##STR1##wherein L represents at least one divalent connecting group selected from the group consisting of --A--NHCO
6296985 Positive photoresist composition comprising a polysiloxane October 2, 2001
A positive photoresist composition comprising (a) an acid-decomposable polysiloxane having a structural unit represented by formula (IV): ##STR1##wherein Z' is a phenyl ring substituted with an acid-decomposable group and (b) a compound which decomposes upon exposure to generate an acid.
6248500 Composition for anti-reflective coating material June 19, 2001
A composition for anti-reflective coating material is disclosed, comprising a polymer compound having repeating units having specific structure, and optionally a melamine, guanamine, urea, phenol, naphthol or hydroxyanthracene compound substituted by at least one group selected from
6165684 Bottom anti-reflective coating material composition and method for forming resist pattern using December 26, 2000
A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective l
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