| Patent Number |
Title Of Patent |
Date Issued |
| 7595087 |
Process of forming platinum coating catalyst layer in moisture-generating reactor |
September 29, 2009 |
| A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrog |
| 7553459 |
Apparatus and reactor for generating and feeding high purity moisture |
June 30, 2009 |
| A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic re |
| 7368092 |
Apparatus and reactor for generating and feeding high purity moisture |
May 6, 2008 |
| A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic re |
| 7258845 |
Apparatus and reactor for generating and feeding high purity moisture |
August 21, 2007 |
| A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic re |
| 7103990 |
Rotary silicon wafer cleaning apparatus |
September 12, 2006 |
| It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.According |
| 7008598 |
Reactor for generating moisture |
March 7, 2006 |
| A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the d |
| 6919056 |
Reactor for generating moisture |
July 19, 2005 |
| A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, and the peeling off of the platinum coat catalyst layer inside are all prevented more completely to further increase the safety of the reactor for generating moisture, and wher |
| 6848470 |
Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow contr |
February 1, 2005 |
| A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow |
| 6820632 |
Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow contr |
November 23, 2004 |
| A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow |
| 6733732 |
Reactor for generating moisture |
May 11, 2004 |
| A reactor comprising a body made of a heat-resistant material and having an inlet and an outlet for water/moisture gas, having a gas-diffusing member provided in an internal space of the body, and having a platinum coating on an internal wall surface of the body. Hydrogen and oxygen fed |
| 6622543 |
Gas detection sensor |
September 23, 2003 |
| A gas detection sensor permits precise measurement of the concentration of flammable gas in a detection or subject gas and the concentration of oxygen in a detection gas containing flammable gases. In the sensor, the heating of the sensor by contact catalytic reaction of flammable gas gi |
| 6422264 |
Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow contr |
July 23, 2002 |
| A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow |
| 6408879 |
Fluid control device |
June 25, 2002 |
| A fluid control device comprises a first passageway, and a second passageway communicating therewith and having a terminating end closed with a fluid control unit or instrument. The first passageway is adapted to pass a fluid therethrough with a different fluid remaining in the secon |
| 6387158 |
Method of removing moisture in gas supply system |
May 14, 2002 |
| A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than |
| 6334962 |
Low flow rate moisture supply process |
January 1, 2002 |
| A process of supplying moisture at low flow rates which permits high precision control of the flow of moisture to a semiconductor manufacturing line from an apparatus for the generation of moisture, characterized in that the flow of hydrogen to a moisture-generating reactor is controlled |
| 6274098 |
Apparatus for the treatment of exhaust gases by combining hydrogen and oxygen |
August 14, 2001 |
| An apparatus for the treatment of exhaust gases containing hydrogen which permits always stable treatment with certainty of the exhaust gases from a semiconductor manufacturing line or the like irrespective of violent fluctuations in the flow rate of the exhaust gases, without having adv |
| 6257270 |
Fluid control device |
July 10, 2001 |
| A fluid control device has formed in a valve main body a main channel communicating with an inlet of a channel within a massflow controller, and a relatively long subchannel and a relatively short subchannel both communicating with the main channel. The process gas to be assure of high |
| 6180067 |
Reactor for the generation of water |
January 30, 2001 |
| An improved reactor for generating water from hydrogen and oxygen which allows production of moisture at a high conversion rate exceeding 99 percent with the temperature kept under some 400.degree. C. inside the reactor shell (1) and with the water vapor production being more than 1, |
| 6178995 |
Fluid supply apparatus |
January 30, 2001 |
| A fluid feeding apparatus includes parallel flow passages connected at their downstream side, each parallel passage including a pressure flow controller (C) for regulating the flow of fluid and a fluid changeover valve (D) for opening and closing the passage on the downstream side of |
| 6093662 |
Method for generating water for semiconductor production |
July 25, 2000 |
| Process for generating moisture for use in semiconductor manufacturing, the process comprising feeding hydrogen and oxygen into a reactor provided with a platinum-coated catalyst layer on an interior wall, thus enhancing the reactivity between hydrogen and oxygen by catalytic action and |
| 6060691 |
Device for heating fluid controller |
May 9, 2000 |
| A device for heating a fluid controller comprises a pair of platelike side heaters pressed respectively against a pair of opposite side faces of a body of the fluid controller with an insulating layer provided between each heater and each side face, a pair of side holding members each ha |
| 6014498 |
Device for heating fluid control apparatus |
January 11, 2000 |
| A device for heating a fluid control apparatus comprises a tape heater disposed on at least one of opposite lateral sides of the fluid control apparatus, and a plurality of brackets each comprising a bottom wall fastened to a panel with a screw and at least one side wall for holding |
| 5983933 |
Shutoff-opening device |
November 16, 1999 |
| A valve mount having two valves removably installed thereon from above as arranged in a direction comprises an inflow channel forming member having a channel in communication with an inlet of the valve disposed at one end thereof, a communication channel forming member having a channel f |
| 5975112 |
Fluid control device |
November 2, 1999 |
| A fluid control device has formed in a valve main body a main channel communicating with an inlet of a channel within a massflow controller, and a relatively long subchannel and a relatively short subchannel both communicating with the main channel. The process gas to be assure of high |
| 5950675 |
Backflow prevention apparatus for feeding a mixture of gases |
September 14, 1999 |
| An apparatus for mixing and feeding plural gases flowing at different mass flow rates and having different molecular weights includes a plurality of gas feed lines connected to a mixing region having an outlet for feeding a mixture of the gases to a semiconductor production apparatus. Th |
| 5816285 |
Pressure type flow rate control apparatus |
October 6, 1998 |
| A pressure type flow rate control apparatus (1) controls flow rate of a fluid in an environment where a ratio of P2/P1 between an absolute pressure P1 at an upstream side of an orifice and an absolute pressure P2 at a downstream side of the orifice is maintained at a value less than |
| 5791369 |
Pressure type flow rate control apparatus |
August 11, 1998 |
| A pressure type flow rate control apparatus (1) for controlling flow rate of a fluid maintains an upstream side pressure P1 of an orifice at more than about twice a downstream side pressure P2. In addition to an orifice-forming member (5) the apparatus includes a control valve (2) pr |
| 5669408 |
Pressure type flow rate control apparatus |
September 23, 1997 |
| A pressure type flow rate control apparatus (1) for controlling flow rate of a fluid maintains an upstream side pressure P1 of an orifice at more than about twice a downstream side pressure P2. In addition to an orifice-forming member (5) the apparatus includes a control valve (2) pr |
| 5488967 |
Method and apparatus for feeding gas into a chamber |
February 6, 1996 |
| A vacuum deposition chamber alternately receives a reactive gas and an inert gas during a process in which a thin film is formed on a wafer in the chamber. The inert gas flows through a first pressure regulator, a first feed line and a first changeover valve into the chamber. The rea |
| 5427357 |
Control valve |
June 27, 1995 |
| A control valve comprises a valve body having a fluid channel and a valve seat; a valve operating part; a valve stem supporting member having its upper end fixed to the valve operating part and its lower end fixed to the valve body; a valve stem penetrating the valve stem supporting memb |
| 5379982 |
Control valve |
January 10, 1995 |
| A control valve comprises a valve body having a fluid channel and a valve seat; a valve operating part; a valve stem supporting member having its upper end fixed to the valve operating part and its lower end fixed to the valve body; a valve stem penetrating the valve stem supporting memb |
