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Inventor: Matsuo; Takenobu
Address: Tokyo, JP
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6403498 |
Method and device for treating substrate |
June 11, 2002 |
| A substrate processing method of processing a surface of a substrate in manufacture of a semiconductor device, characterized by comprising a surface processing step for making a substance having an adsorption heat higher than that of an organic matter whose adsorption on the surface of |
| 5294280 |
Gas measuring device and processing apparatus provided with the gas measuring device |
March 15, 1994 |
| A gas measuring device includes a dissolving unit for dissolving gas to be measured in solvent medium, a measuring unit for measuring the amount of ions generated when the gas to be measured is ionized in the liquid medium, and a calculating unit for calculating the amount of the gas to |
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