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Inventor:
Maruyama; Katsuhiro
Address:
Takasaki, JP
No. of patents:
3
Patents:












Patent Number Title Of Patent Date Issued
6653418 Process for preparing polymer compound for resist November 25, 2003
There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry
6242533 Novolak type phenol resin June 5, 2001
The present invention relates to a novolak type phenol resin, in particular a novolak type phenol resin for resists suitable for forming resist patterns. The novolak type phenol resin of the present invention is obtained by reacting at least a vinylphenol having a vinyl group and a p
6211328 Phenol resin April 3, 2001
The present invention relates to a phenol resin, in particular a phenol resin for resists suitable for forming resist patterns. The phenol resin of the present invention is obtained by reacting at least two components, i.e., a compound (A) such as 4-hydroxymethyl-2,6-dimethylphenol and a










 
 
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