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Maeda; Kenji
Koganei, JP
No. of patents:

Patent Number Title Of Patent Date Issued
8142567 Vacuum processing apparatus March 27, 2012
A vacuum processing apparatus includes a member having a gas passage formed in a center between the pressure adjusting valve of an exhaust system and a turbo-molecular pump, and a particle dispersion prevention unit having plural stationary blades formed to be tilted in a direction o
8029874 Plasma processing apparatus and method for venting the same to atmosphere October 4, 2011
In a plasma processing apparatus provided with control means, gas supply means includes a first gas supply path for supplying a vent gas into a processing chamber by way of a shower plate and a second gas supply path for supplying a vent gas into the processing chamber without via the
7842619 Plasma processing method November 30, 2010
A plasma processing method includes etching an insulating film of a sample to be processed using plasma generated from etching gas, supplying a large flow of inert gas from above the sample while having the sample mounted on a sample mounting stage, supplying deposit removal gas to only

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