| Patent Number |
Title Of Patent |
Date Issued |
| 7301055 |
Process for removing methanol from formaldehyde-containing solutions |
November 27, 2007 |
| Process for removing methanol from formaldehyde-containing solutions. The present invention relates to a process for removing methanol from formaldehyde-containing solutions, with methanol being converted into formaldehyde dimethyl acetal by reactive distillation in the presence of a |
| 5614351 |
Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for hig |
March 25, 1997 |
| A radiation-curable mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and contains an acid-curable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pK.sub.a |
| 5403697 |
Positive radiation-sensitive mixture and recording material produced therefrom |
April 4, 1995 |
| A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of high-energy radiation and an acid-cleavable compound, wherein the compound which forms an acid contains aromatically bound chlorine or bromine and has a pK.sub.a value of les |
| 5342582 |
Apparatus for reprocessing special waste |
August 30, 1994 |
| An apparatus for reprocessing special waste of photocrosslinkable scrap material is composed of a housing equipped with a feed hopper, one or more UV emitters arranged in the housing to irradiate the scrap material, and a chopper arranged in the housing to comminute the scrap material by |
| 5340682 |
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising |
August 23, 1994 |
| A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.-carbonyl-.alpha.-sulfonyl-diazomethane, which forms a strong acid on irradiation, of the general formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one a |
| 5338641 |
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising |
August 16, 1994 |
| A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.,.alpha.-bis(sulfonyl)diazomethane, which forms a strong acid on irradiation, of the general formula ##STR1## in which R is an optionally substituted alkyl, cycloalkyl, a |
| 5234791 |
Radiation-curable composition and radiation-sensitive recording material prepared therefrom for |
August 10, 1993 |
| A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pK.sub.a value below 12. The compos |
| 5221595 |
Photopolymerizable mixture and recording material prepared therefrom |
June 22, 1993 |
| A photopolymerizable mixture is disclosed that contains a polymer binder, a polymerizable compound having at least one terminal ethylene double bond and a boiling point above 100.degree. C. at normal pressure, a hexaarylbisimidazole and a 1,3-diarylpyrazoline or a 1-aryl-3-aralkenyl- |
| 5217843 |
Positive radiation-sensitive mixture, and radiation-sensitive recording material produced theref |
June 8, 1993 |
| A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a p |
| 5137799 |
Electrically conductive resist material, a process for its preparation and its use |
August 11, 1992 |
| An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically |
| 5072025 |
Process for the production of 3,5-disubstituted-4-acetoxystyrene |
December 10, 1991 |
| 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After s |
| 5025097 |
4-chlorooxazole derivatives and processes for their preparation and use |
June 18, 1991 |
| The invention relates to 4-chlorooxazole derivatives of the general formula I ##STR1## which carry an unsaturated group in the 2- or 5-position, e.g., the --CH.dbd.CH-- or --CH.dbd.CH--CH.dbd.CH-- group.In the formulaR.sub.1 is phenyl, which is optionally substituted in one or more p |
| 4946759 |
Positive radiation-sensitive mixture and radiation-sensitive recording material produced therefr |
August 7, 1990 |
| A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of actinic radiation, and an acid-cleavable compound, the acid-cleavable compound producing, as cleavage product, an aromatically-substituted alcohol of the general formula |
| 4933495 |
Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxystyrene, its polymerization, |
June 12, 1990 |
| The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerizatio |
| 4927956 |
3,5-disubstituted-4-acetoxystyrene and process for its production |
May 22, 1990 |
| 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After s |
| 4892799 |
4-chlorooxazole derivatives and processes for their preparation and use |
January 9, 1990 |
| The invention relates to 4-chlorooxazole derivatives of the general formula I ##STR1## which carry an unsaturated group in the 2- or 5-position, e.g., the --CH.dbd.CH-- or --CH.dbd.CH--CH.dbd.CH-- group.In the formulaR.sub.1 is phenyl, which is optionally substituted in one or more p |
| 4869983 |
Sulfonyl-containing styrene derivatives and their use in electrophotographic processes |
September 26, 1989 |
| Method and composition for a sulfonyl-containing styrene derivative of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, optionally halogen-, hydroxyl-, cyano- or (C.sub.1 -C.sub.4 -alkoxy mono- or poly-substituted (C.sub.1 |
| 4868257 |
Process for the production of 3-mono or 3,5 disubstituted-4-acetoxystyrene, its polymerization |
September 19, 1989 |
| The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerizatio |
| 4868256 |
Process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene its polymerization, a |
September 19, 1989 |
| The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerizatio |
| 4684594 |
Electrophotographic process for preparing printing forms using alkaline decoater solution |
August 4, 1987 |
| Printing forms or metallized images can be prepared electrophotographically by a process comprising the electrostatic chargeup, imagewise exposure and tonering of a photoconductor layer applied to an electroconductive base material, followed by fixing of the tonered image areas, removal |
