| Patent Number |
Title Of Patent |
Date Issued |
| 7542141 |
Stage controller and exposure method in which position of the stage is controlled based on posit |
June 2, 2009 |
| An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the stage in the first direction. A control unit (i) obtains a position of the stage based on an |
| 7411678 |
Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semi |
August 12, 2008 |
| An alignment apparatus which drives to a target position a stage capable of moving at least in a two-dimensional direction. A first measurement device and a second measurement device have a function of measuring positions of the stage in one direction from different positions, a swit |
| 7027128 |
Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and |
April 11, 2006 |
| A scanning exposure apparatus for exposing a substrate to a pattern of a reticle. The apparatus includes an exposure system which exposes the substrate to the pattern with respect to a unit region, to which the pattern is transferred, of the substrate, by relatively moving the reticl |
| 7016049 |
Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, s |
March 21, 2006 |
| An alignment apparatus including a first position measuring device and a second position measuring device which measure position information of an object to be controlled, a switching device which switches a position measuring system from the first position measuring device to the second |
| 6940584 |
Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and |
September 6, 2005 |
| A scanning exposure apparatus for exposing a substrate to a pattern includes an exposure system which exposes the substrate to the pattern with respect to a unit region of the substrate to which the pattern is transferred, a determination system which determines whether a condition o |
| 6870599 |
Exposure method and apparatus, and device manufacturing method |
March 22, 2005 |
| A scanning exposure apparatus is provided that is capable of increasing the overlay accuracy. Every time a reticle is exchanged, a direction overlay correction table is updated. A control device for the exposure apparatus corrects the target positions (target locus) of a wafer stage on t |
| 6704093 |
Scanning exposure apparatus, scanning exposure method, and device manufacturing method |
March 9, 2004 |
| A scanning exposure apparatus transfers a pattern of a master to a substrate with slit-shaped exposure light while a master stage holding the master and a substrate stage holding the substrate are moved. The apparatus includes a measurement unit arranged to measure positional sync de |
| 6657703 |
Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and |
December 2, 2003 |
| An exposure apparatus which has a stage for aligning a substrate surface to an imaging plane on the basis of a detection signal from a focus sensor, moves the substrate by the stage, transfers a projection pattern, and exposes the substrate. The apparatus includes a controller for, when |
