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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Koitabashi; Ryuji
Address:
Joetsu, JP
No. of patents:
3
Patents:












Patent Number Title Of Patent Date Issued
7977027 Resist composition and patterning process July 12, 2011
A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from col
7312016 Chemically amplified positive resist composition and patterning process December 25, 2007
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high
7288363 Chemically amplified positive resist composition and patterning process October 30, 2007
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high










 
 
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