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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Kobayashi; Naoyuki
Address:
Fukaya, JP
No. of patents:
16
Patents:












Patent Number Title Of Patent Date Issued
8208119 Exposure apparatus, exposure method, and method for producing device June 26, 2012
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by t
8174668 Exposure apparatus and method for producing device May 8, 2012
A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liqui
8169592 Exposure apparatus and method for producing device May 1, 2012
An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the
8134682 Exposure apparatus and method for producing device March 13, 2012
A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleanin
8130363 Exposure apparatus and method for producing device March 6, 2012
A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is diffe
8125612 Exposure apparatus and method for producing device February 28, 2012
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern on
8089611 Exposure apparatus and method for producing device January 3, 2012
A vacuum system for an immersion exposure apparatus includes a flow passage connected to a vacuum source, and a separator provided on the flow passage. The separator separates any gas from a liquid sucked into the flow passage together with the gas.
8072576 Exposure apparatus and method for producing device December 6, 2011
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern on
8004653 Exposure apparatus and method for producing device August 23, 2011
A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is diffe
7995187 Exposure apparatus and method for producing device August 9, 2011
A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liqui
7834976 Exposure apparatus and method for producing device November 16, 2010
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed. The apparatus also includes a reference mark that serves as a reference for an alignment between the reticle and the object. The apparatus also includes a first
7817244 Exposure apparatus and method for producing device October 19, 2010
An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus include
7589820 Exposure apparatus and method for producing device September 15, 2009
An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes
7505115 Exposure apparatus, method for producing device, and method for controlling exposure apparatus March 17, 2009
An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid
7388649 Exposure apparatus and method for producing device June 17, 2008
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern on
7242455 Exposure apparatus and method for producing device July 10, 2007
An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus include










 
 
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