| Patent Number |
Title Of Patent |
Date Issued |
| 8208119 |
Exposure apparatus, exposure method, and method for producing device |
June 26, 2012 |
| An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by t |
| 8174668 |
Exposure apparatus and method for producing device |
May 8, 2012 |
| A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liqui |
| 8169592 |
Exposure apparatus and method for producing device |
May 1, 2012 |
| An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the |
| 8134682 |
Exposure apparatus and method for producing device |
March 13, 2012 |
| A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleanin |
| 8130363 |
Exposure apparatus and method for producing device |
March 6, 2012 |
| A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is diffe |
| 8125612 |
Exposure apparatus and method for producing device |
February 28, 2012 |
| There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern on |
| 8089611 |
Exposure apparatus and method for producing device |
January 3, 2012 |
| A vacuum system for an immersion exposure apparatus includes a flow passage connected to a vacuum source, and a separator provided on the flow passage. The separator separates any gas from a liquid sucked into the flow passage together with the gas. |
| 8072576 |
Exposure apparatus and method for producing device |
December 6, 2011 |
| There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern on |
| 8004653 |
Exposure apparatus and method for producing device |
August 23, 2011 |
| A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is diffe |
| 7995187 |
Exposure apparatus and method for producing device |
August 9, 2011 |
| A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liqui |
| 7834976 |
Exposure apparatus and method for producing device |
November 16, 2010 |
| An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed. The apparatus also includes a reference mark that serves as a reference for an alignment between the reticle and the object. The apparatus also includes a first |
| 7817244 |
Exposure apparatus and method for producing device |
October 19, 2010 |
| An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus include |
| 7589820 |
Exposure apparatus and method for producing device |
September 15, 2009 |
| An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes |
| 7505115 |
Exposure apparatus, method for producing device, and method for controlling exposure apparatus |
March 17, 2009 |
| An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid |
| 7388649 |
Exposure apparatus and method for producing device |
June 17, 2008 |
| There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern on |
| 7242455 |
Exposure apparatus and method for producing device |
July 10, 2007 |
| An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus include |
