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Inventor:
Kobayashi; Hiroyuki
Address:
Kodaira, JP
No. of patents:
8
Patents:












Patent Number Title Of Patent Date Issued
8197635 Plasma processing apparatus including etching processing apparatus and ashing processing apparat June 12, 2012
A diameter of a mounting unit of the stage of an ashing processing apparatus is less than a diameter of a mounting unit of the stage of an etching processing apparatus, and the diameter of the mounting unit of the stage of the etching processing apparatus is less than a diameter of a
8187485 Plasma processing apparatus including etching processing apparatus and ashing processing apparat May 29, 2012
A diameter of a mounting unit of the stage of an ashing processing apparatus is less than a diameter of a mounting unit of the stage of an etching processing apparatus, and the diameter of the mounting unit of the stage of the etching processing apparatus is less than a diameter of a
8163652 Plasma processing method and plasma processing device April 24, 2012
A plasma processing method using plasma includes steps of applying current to a coil and introducing gas into a processing chamber, applying a bias power that does not generate plasma, applying a source power to generate plasma so that a plasma density distribution is high above an o
8142567 Vacuum processing apparatus March 27, 2012
A vacuum processing apparatus includes a member having a gas passage formed in a center between the pressure adjusting valve of an exhaust system and a turbo-molecular pump, and a particle dispersion prevention unit having plural stationary blades formed to be tilted in a direction o
8029874 Plasma processing apparatus and method for venting the same to atmosphere October 4, 2011
In a plasma processing apparatus provided with control means, gas supply means includes a first gas supply path for supplying a vent gas into a processing chamber by way of a shower plate and a second gas supply path for supplying a vent gas into the processing chamber without via the
7767054 Plasma processing apparatus August 3, 2010
A plasma processing apparatus includes a vacuum processing chamber, supplying means for introducing a processing gas into the vacuum processing chamber, a mounting electrode in the vacuum processing chamber for mounting a specimen on the mounting electrode, and a pusher pin for raisi
7662232 Plasma processing apparatus February 16, 2010
The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber 1, means 13 and 14 for supplying processing gas into the processing chamber, evacuation means 25 and 26
7435687 Plasma processing method and plasma processing device October 14, 2008
The invention provides a plasma processing method and plasma processing device for manufacturing semiconductor devices in which the number of foreign particles being adhered to the wafer is reduced greatly and the yield is improved. In a plasma processing device having a plasma source










 
 
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