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Knotter; Dirk M.
Eindhoven, NL
No. of patents:

Patent Number Title Of Patent Date Issued
6562254 Etching method May 13, 2003
A method of reducing the thickness t of a layer of material on a substrate when the substrate is exposed to an etchant for a span of time sufficient to reduce t to a value t.sub.o, at which point exposure to the etchant is interrupted, includes the thickness to being determined using mon
5622896 Method of manufacturing a thin silicon-oxide layer April 22, 1997
A method of providing an ultra-thin (<1 nm) silicon-oxide layer on a substrate surface, for example, of a metal. A film of a solution of a polyorganosiloxane is applied to the substrate surface. After drying, the polyorganosiloxane is completely converted to said silicon-oxide layer b

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