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Kim; In-Sung
Suwon-si, KR
No. of patents:

Patent Number Title Of Patent Date Issued
8287792 Methods of forming fine patterns using a nanoimprint lithography October 16, 2012
In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of siz
8158958 Flare evaluation methods April 17, 2012
A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measur
8119309 Reflective photomask and method of fabricating, reflective illumination system and method of pro February 21, 2012
A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption p
8006202 Systems and methods for UV lithography August 23, 2011
A method of designing a lithographic mask for use in lithographic processing of a substrate is disclosed. The lithographic processing comprises irradiating mask features of a lithographic mask using a predetermined irradiation configuration. In one aspect, the method comprises obtain
7475383 Method of fabricating photo mask January 6, 2009
Provided is a method of fabricating a photo mask. The method includes preparing a model group including optical proximity correction (OPC) models and generating a preliminary mask layout using an integrated circuit (IC) layout. A contour image may be produced from the preliminary mas

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