| Patent Number |
Title Of Patent |
Date Issued |
| 8287792 |
Methods of forming fine patterns using a nanoimprint lithography |
October 16, 2012 |
| In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of siz |
| 8158958 |
Flare evaluation methods |
April 17, 2012 |
| A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measur |
| 8119309 |
Reflective photomask and method of fabricating, reflective illumination system and method of pro |
February 21, 2012 |
| A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption p |
| 8006202 |
Systems and methods for UV lithography |
August 23, 2011 |
| A method of designing a lithographic mask for use in lithographic processing of a substrate is disclosed. The lithographic processing comprises irradiating mask features of a lithographic mask using a predetermined irradiation configuration. In one aspect, the method comprises obtain |
| 7475383 |
Method of fabricating photo mask |
January 6, 2009 |
| Provided is a method of fabricating a photo mask. The method includes preparing a model group including optical proximity correction (OPC) models and generating a preliminary mask layout using an integrated circuit (IC) layout. A contour image may be produced from the preliminary mas |
